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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 48, Iss. 9 — Mar. 20, 2009
  • pp: 1727–1732

Atomic layer deposition of Al 2 O 3 and TiO 2 multilayers for applications as bandpass filters and antireflection coatings

Adriana Szeghalmi, Michael Helgert, Robert Brunner, Frank Heyroth, Ulrich Gösele, and Mato Knez  »View Author Affiliations


Applied Optics, Vol. 48, Issue 9, pp. 1727-1732 (2009)
http://dx.doi.org/10.1364/AO.48.001727


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Abstract

Al 2 O 3 and TiO 2 thin films have been deposited on Si wafers, quartz, BK7 glass, and polycarbonate substrates by atomic layer deposition (ALD). The refractive indices and growth rates of the materials have been determined by spectroscopic ellipsometry and transmission electron microscopy. The influence of substrate temperature and precursor on the refractive indices has been investigated. The refractive index of TiO 2 significantly increases with temperature, whereas the Al 2 O 3 films are temperature insensitive. The films deposited using H 2 O 2 as oxygen source show a slightly higher refractive index than the films prepared with H 2 O . Multilayer narrow-bandpass filters and broadband antireflective coatings have been designed and produced by ALD.

© 2009 Optical Society of America

OCIS Codes
(310.0310) Thin films : Thin films
(310.1210) Thin films : Antireflection coatings
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication
(310.4165) Thin films : Multilayer design

ToC Category:
Thin Films

History
Original Manuscript: January 6, 2009
Revised Manuscript: March 3, 2009
Manuscript Accepted: March 3, 2009
Published: March 13, 2009

Citation
Adriana Szeghalmi, Michael Helgert, Robert Brunner, Frank Heyroth, Ulrich Gösele, and Mato Knez, "Atomic layer deposition of Al2O3 and TiO2 multilayers for applications as bandpass filters and antireflection coatings," Appl. Opt. 48, 1727-1732 (2009)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-48-9-1727

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