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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 49, Iss. 2 — Jan. 10, 2010
  • pp: 229–238

Performance of an improved logarithmic phase mask with optimized parameters in a wavefront-coding system

Hui Zhao and Yingcai Li  »View Author Affiliations


Applied Optics, Vol. 49, Issue 2, pp. 229-238 (2010)
http://dx.doi.org/10.1364/AO.49.000229


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Abstract

In two papers [ Proc. SPIE 4471, 272–280 (2001) and Appl. Opt. 43, 2709–2721 (2004)], a logarithmic phase mask was proposed and proved to be effective in extending the depth of field; however, according to our research, this mask is not that perfect because the corresponding defocused modulation transfer function has large oscillations in the low-frequency region, even when the mask is optimized. So, in a previously published paper [ Opt. Lett. 33, 1171–1173 (2008)], we proposed an improved logarithmic phase mask by making a small modification. The new mask can not only eliminate the drawbacks to a certain extent but can also be even less sensitive to focus errors according to Fisher information criteria. However, the performance comparison was carried out with the modified mask not being optimized, which was not reasonable. In this manuscript, we optimize the modified logarithmic phase mask first before analyzing its performance and more convincing results have been obtained based on the analysis of several frequently used metrics.

© 2010 Optical Society of America

OCIS Codes
(110.0110) Imaging systems : Imaging systems
(110.1758) Imaging systems : Computational imaging

ToC Category:
Imaging Systems

History
Original Manuscript: August 14, 2009
Revised Manuscript: October 18, 2009
Manuscript Accepted: December 8, 2009
Published: January 7, 2010

Citation
Hui Zhao and Yingcai Li, "Performance of an improved logarithmic phase mask with optimized parameters in a wavefront-coding system," Appl. Opt. 49, 229-238 (2010)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-49-2-229

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