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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 49, Iss. 22 — Aug. 1, 2010
  • pp: 4321–4325

Atomic layer deposited titanium dioxide and its application in resonant waveguide grating

T. Alasaarela, T. Saastamoinen, J. Hiltunen, A. Säynätjoki, A. Tervonen, P. Stenberg, M. Kuittinen, and S. Honkanen  »View Author Affiliations

Applied Optics, Vol. 49, Issue 22, pp. 4321-4325 (2010)

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We demonstrate good optical quality Ti O 2 thin films grown by atomic layer deposition at 120 ° C . The optical properties were studied using spectroscopic ellipsometry and prism coupling methods. The refractive index was 2.27, and the slab waveguide propagation loss was less than 1 dB / cm at 1.53 μm . A high quality resonant waveguide grating was fabricated using a thin Ti O 2 layer on top of a Si O 2 grating.

© 2010 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(130.3130) Integrated optics : Integrated optics materials
(310.2785) Thin films : Guided wave applications

ToC Category:
Integrated Optics

Original Manuscript: April 22, 2010
Manuscript Accepted: June 18, 2010
Published: July 30, 2010

T. Alasaarela, T. Saastamoinen, J. Hiltunen, A. Säynätjoki, A. Tervonen, P. Stenberg, M. Kuittinen, and S. Honkanen, "Atomic layer deposited titanium dioxide and its application in resonant waveguide grating," Appl. Opt. 49, 4321-4325 (2010)

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