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Interferometric lithography for nanoscale feature patterning: a comparative analysis between laser interference, evanescent wave interference, and surface plasmon interference |
Applied Optics, Vol. 49, Issue 35, pp. 6710-6717 (2010)
http://dx.doi.org/10.1364/AO.49.006710
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Abstract
In this paper, we experimentally demonstrate and compare single-exposure multiple-beam interference lithography based on conventional laser interference, evanescent wave interference, and surface plasmon interference. The proposed two-beam and four-beam interference approaches are carried out theoretically and verified experimentally, employing the proposed configurations so as to realize the patterning of one- and two-dimensional periodic features on photoresists. A custom-fabricated grating is employed in the configuration in order to achieve two- and four-beam interference.
© 2010 Optical Society of America
OCIS Codes
(220.3740) Optical design and fabrication : Lithography
(240.6680) Optics at surfaces : Surface plasmons
(260.3910) Physical optics : Metal optics
ToC Category:
Optical Design and Fabrication
History
Original Manuscript: July 29, 2010
Revised Manuscript: October 26, 2010
Manuscript Accepted: October 27, 2010
Published: December 1, 2010
Citation
Kandammathe Valiyaveedu Sreekanth, Jeun Kee Chua, and Vadakke Matham Murukeshan, "Interferometric lithography for nanoscale feature patterning: a comparative analysis between laser interference, evanescent wave interference, and surface plasmon interference," Appl. Opt. 49, 6710-6717 (2010)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-49-35-6710
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