Impact of electron-beam lithography irregularities across millimeter-scale resonant grating filter performances
Applied Optics, Vol. 49, Issue 4, pp. 658-662 (2010)
http://dx.doi.org/10.1364/AO.49.000658
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Abstract
We investigated the impact of electron-beam lithography writing imperfections on the performance of two-dimensional resonant grating notch filters. This large area photonic device provides an interesting benchmark to assess the acceptable limits of unavoidable fabrication errors. We found that field stitching errors up to
© 2010 Optical Society of America
OCIS Codes
(050.0050) Diffraction and gratings : Diffraction and gratings
(220.0220) Optical design and fabrication : Optical design and fabrication
(220.3740) Optical design and fabrication : Lithography
(050.5745) Diffraction and gratings : Resonance domain
ToC Category:
Diffraction and Gratings
History
Original Manuscript: October 7, 2009
Revised Manuscript: December 24, 2009
Manuscript Accepted: December 25, 2009
Published: January 26, 2010
Citation
Anne Talneau, Fabien Lemarchand, Anne-Laure Fehrembach, and Anne Sentenac, "Impact of electron-beam lithography irregularities across millimeter-scale resonant grating filter performances," Appl. Opt. 49, 658-662 (2010)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-49-4-658
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