Abstract

Theoretical modeling of a slit-scan-type aerial image measurement sensor used for optical lithography is presented. Slit transmission properties are fully represented by the slit transfer function in terms of incident and scattering angles of light, which is then incorporated into the scheme of a partially coherent imaging formula to obtain an expression for image profiles measured by slit scanning. As an exemplary case, we analyze the influence of a $100\mathrm{nm}$ width slit used in an ArF lithography system. To understand the mechanism of image profile changes by slit transmission, we focus on frequency transfer characteristics of sinusoidal patterns.

© 2011 Optical Society of America

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