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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 50, Iss. 31 — Nov. 1, 2011
  • pp: G131–G136

Subwavelength imaging of a multilayered superlens with layers of nonequal thickness

Weijie Kong, Xiaoping Zhang, Pengfei Cao, Lin Cheng, Qunfeng Shao, Xining Zhao, Li Gong, and Xin Jin  »View Author Affiliations

Applied Optics, Vol. 50, Issue 31, pp. G131-G136 (2011)

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We propose a multilayered superlens comprising alternately layered metal and dielectric films with layers of nonequal thickness to realize subwavelength imaging, even when permittivities of the metal and dielectric are mismatched. Based on ideal imaging conditions, the exact constraint relations about the thickness of each dielectric layer and the permittivity of the surrounding medium of the multilayered superlens are first acquired when the superlens is modeled by the effective medium theory. Theoretical analysis and numerical simulations indicate that a multilayered superlens with constraint relations can realize subwavelength imaging at wavelengths of 335 to 385 nm .

© 2011 Optical Society of America

OCIS Codes
(310.4165) Thin films : Multilayer design
(310.6628) Thin films : Subwavelength structures, nanostructures

Original Manuscript: July 5, 2011
Revised Manuscript: August 8, 2011
Manuscript Accepted: October 14, 2011
Published: October 25, 2011

Weijie Kong, Xiaoping Zhang, Pengfei Cao, Lin Cheng, Qunfeng Shao, Xining Zhao, Li Gong, and Xin Jin, "Subwavelength imaging of a multilayered superlens with layers of nonequal thickness," Appl. Opt. 50, G131-G136 (2011)

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