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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 50, Iss. 9 — Mar. 20, 2011
  • pp: C201–C209

Design and manufacture of metal/dielectric long-wavelength cutoff filters

Penghui Ma, Fengchen Lin, and J. A. Dobrowolski  »View Author Affiliations


Applied Optics, Vol. 50, Issue 9, pp. C201-C209 (2011)
http://dx.doi.org/10.1364/AO.50.00C201


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Abstract

Thin films of high reflecting metal, such as Ag, have a high reflectance in the long-wavelength region. When they are combined with dielectric layers, it is possible, through thin film interference effects, to induce transmission in certain shorter wavelength regions. Thus, they are useful components for the design of long-wavelength cutoff filters with a broad rejection region. In this paper, metal/dielectric multilayer designs based on this principle are numerically investigated. Three designs with different cutoff wavelengths and with very broad transmission regions in the visible or near-IR spectral ranges are presented. An excellent rejection on the long-wavelength side extends beyond 20 μm . Experimental results for one of the designs produced in our magnetron sputtering system are given.

© 2011 Optical Society of America

OCIS Codes
(310.1860) Thin films : Deposition and fabrication
(350.2460) Other areas of optics : Filters, interference
(310.3915) Thin films : Metallic, opaque, and absorbing coatings
(310.6845) Thin films : Thin film devices and applications

History
Original Manuscript: August 13, 2010
Revised Manuscript: October 31, 2010
Manuscript Accepted: November 3, 2010
Published: December 13, 2010

Citation
Penghui Ma, Fengchen Lin, and J. A. Dobrowolski, "Design and manufacture of metal/dielectric long-wavelength cutoff filters," Appl. Opt. 50, C201-C209 (2011)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-50-9-C201

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