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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 50, Iss. 9 — Mar. 20, 2011
  • pp: C232–C238

Plasma-assisted deposition of metal fluoride coatings and modeling the extinction coefficient of as-deposited single layers

Martin Bischoff, Olaf Stenzel, Karen Friedrich, Steffen Wilbrandt, Dieter Gäbler, Stefan Mewes, and Norbert Kaiser  »View Author Affiliations

Applied Optics, Vol. 50, Issue 9, pp. C232-C238 (2011)

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We realized metal fluoride coatings with a high packing density and a low extinction coefficient by plasma (ion)-assisted deposition. The densification can be performed by different types of plasma sources, e.g., by a Leybold LION source and a Leybold APSpro, respectively. But the as-deposited coatings show a characteristic absorption behavior, whereas the absorption losses can be reduced in a postdeposition UV treatment step. We show experimental results of the plasma-assisted metal fluorides before and after the UV treatment and present a new model that allows us to describe and calculate the characteristic absorption losses of LaF 3 , MgF 2 , and AlF 3 .

© 2011 Optical Society of America

OCIS Codes
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties
(310.3915) Thin films : Metallic, opaque, and absorbing coatings

Original Manuscript: August 2, 2010
Manuscript Accepted: October 18, 2010
Published: December 28, 2010

Martin Bischoff, Olaf Stenzel, Karen Friedrich, Steffen Wilbrandt, Dieter Gäbler, Stefan Mewes, and Norbert Kaiser, "Plasma-assisted deposition of metal fluoride coatings and modeling the extinction coefficient of as-deposited single layers," Appl. Opt. 50, C232-C238 (2011)

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