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Optimization of coating uniformity in an ion beam sputtering system using a modified planetary rotation method |
Applied Optics, Vol. 50, Issue 9, pp. C316-C320 (2011)
http://dx.doi.org/10.1364/AO.50.00C316
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Abstract
A modified planetary rotation system has been developed to obtain high uniformity optical coatings on large substrates in an ion beam sputter coater. The system allows the normally fixed sun gear to rotate, thus allowing an extra degree of freedom and permitting more complex motions to be used. By moving the substrate platen between two fixed positions around the sun axis, averaging of the distributions at these two positions takes place and improved uniformity can be achieved. A peak-to-valley radial uniformity of
© 2011 Optical Society of America
OCIS Codes
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization
History
Original Manuscript: July 30, 2010
Revised Manuscript: November 13, 2010
Manuscript Accepted: November 24, 2010
Published: January 27, 2011
Citation
Mark Gross, Svetlana Dligatch, and Anatoli Chtanov, "Optimization of coating uniformity in an ion beam sputtering system using a modified planetary rotation method," Appl. Opt. 50, C316-C320 (2011)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-50-9-C316
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