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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 51, Iss. 1 — Jan. 1, 2012
  • pp: 114–120

Micro texturing of silicon using pulsed N2-laser and formation mechanism

Barada K. Nayak and Mool C. Gupta  »View Author Affiliations


Applied Optics, Vol. 51, Issue 1, pp. 114-120 (2012)
http://dx.doi.org/10.1364/AO.51.000114


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Abstract

A low-cost pulsed N2-laser has been used to successfully demonstrate the formation of self-organized conical microtexture in Si. The process is demonstrated in vacuum environment to avoid the use of SF6 gas and sulfur incorporation. The microtexture is formed with an average structure height of 15um, base diameter 10μm, and tip-to-tip separation 8μm. Energy dispersive x-ray spectroscopy of individual conelike structure shows that the material remains free from impurity incorporation. We have shown that the laser-induced-damage-related absorption can be successfully restored after an hour annealing at 1000 °C, making the material an ideal candidate for photovoltaic and other photonic applications.

© 2012 Optical Society of America

OCIS Codes
(040.5350) Detectors : Photovoltaic
(040.6040) Detectors : Silicon
(140.0140) Lasers and laser optics : Lasers and laser optics
(160.4760) Materials : Optical properties
(230.4000) Optical devices : Microstructure fabrication

ToC Category:
Optical Devices

History
Original Manuscript: June 27, 2011
Revised Manuscript: September 23, 2011
Manuscript Accepted: September 25, 2011
Published: December 23, 2011

Citation
Barada K. Nayak and Mool C. Gupta, "Micro texturing of silicon using pulsed N2-laser and formation mechanism," Appl. Opt. 51, 114-120 (2012)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-51-1-114

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