OSA's Digital Library

Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 51, Iss. 28 — Oct. 1, 2012
  • pp: 6789–6798

Mid-infrared optical properties of thin films of aluminum oxide, titanium dioxide, silicon dioxide, aluminum nitride, and silicon nitride

Jan Kischkat, Sven Peters, Bernd Gruska, Mykhaylo Semtsiv, Mikaela Chashnikova, Matthias Klinkmüller, Oliana Fedosenko, Stephan Machulik, Anna Aleksandrova, Gregorii Monastyrskyi, Yuri Flores, and W. Ted Masselink  »View Author Affiliations


Applied Optics, Vol. 51, Issue 28, pp. 6789-6798 (2012)
http://dx.doi.org/10.1364/AO.51.006789


View Full Text Article

Enhanced HTML    Acrobat PDF (610 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

The complex refractive index components, n and k, have been studied for thin films of several common dielectric materials with a low to medium refractive index as functions of wavelength and stoichiometry for mid-infrared (MIR) wavelengths within the range 1.54–14.29 μm (7006500cm1). The materials silicon oxide, silicon nitride, aluminum oxide, aluminum nitride, and titanium oxide are prepared using room temperature reactive sputter deposition and are characterized using MIR variable angle spectroscopic ellipsometry. The investigation shows how sensitive the refractive index functions are to the O2 and N2 flow rates, and for which growth conditions the materials deposit homogeneously. It also allows conclusions to be drawn on the degree of amorphousness and roughness. To facilitate comparison of the materials deposited in this work with others, the index of refraction was also determined and provided for the near-IR and visible ranges of the spectrum. The results presented here should serve as a useful information base for designing optical coatings for the MIR part of the electromagnetic spectrum. The results are parameterized to allow them to be easily used for coating design.

© 2012 Optical Society of America

OCIS Codes
(310.1210) Thin films : Antireflection coatings
(310.6860) Thin films : Thin films, optical properties

ToC Category:
Thin Films

History
Original Manuscript: June 4, 2012
Revised Manuscript: August 27, 2012
Manuscript Accepted: August 28, 2012
Published: September 26, 2012

Citation
Jan Kischkat, Sven Peters, Bernd Gruska, Mykhaylo Semtsiv, Mikaela Chashnikova, Matthias Klinkmüller, Oliana Fedosenko, Stephan Machulik, Anna Aleksandrova, Gregorii Monastyrskyi, Yuri Flores, and W. Ted Masselink, "Mid-infrared optical properties of thin films of aluminum oxide, titanium dioxide, silicon dioxide, aluminum nitride, and silicon nitride," Appl. Opt. 51, 6789-6798 (2012)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-51-28-6789


Sort:  Author  |  Year  |  Journal  |  Reset  

References

  1. F. Tittel, D. Richter, and A. Fried, “Mid-infrared laser applications in spectroscopy,” in Solid-State Mid-Infrared Laser Sources (Springer, 2003), pp. 458–529.
  2. J. D. T. Kruschwitz and W. T. Pawlewicz, “Optical and durability properties of infrared transmitting thin films,” Appl. Opt. 36, 2157–2159 (1997). [CrossRef]
  3. K. Marsh and J. Savage, “Infrared optical materials for 8–13 μm—current developments and future prospects,” Infrared Phys. 14, 85–97 (1974). [CrossRef]
  4. P. Black and J. Wales, “Materials for use in the fabrication of infrared interference filters,” Infrared Phys. 8, 209–222 (1968). [CrossRef]
  5. P. Kelly and R. Arnell, “Magnetron sputtering: A review of recent developments and applications,” Vacuum 56, 159–172 (2000). [CrossRef]
  6. S. Berg, T. Larsson, C. Nender, and H.-O. Blom, “Predicting thin-film stoichiometry in reactive sputtering,” J. Appl. Phys. 63, 887–891 (1988). [CrossRef]
  7. H. Tompkins and E. Irene, Handbook of Ellipsometry (William Andrew, 2005).
  8. G. Jellison and F. Modine, “Parameterization of the optical functions of amorphous materials in the interband region,” Appl. Phys. Lett. 69, 371–373 (1996). [CrossRef]
  9. J. Tauc, R. Grigorovici, and A. Vancu, “Optical properties and electronic structure of amorphous germanium,” Phys. Status Solidi B 15, 627–637 (1966). [CrossRef]
  10. H. Fujiwara, Spectroscopic Ellipsometry: Principles and Applications (Wiley, 2007).
  11. J. Humlíček, “Sensitivity extrema in multiple-angle ellipsometry,” J. Opt. Soc. Am. A 2, 713–722 (1985). [CrossRef]
  12. R. P. Howson, “The reactive sputtering of oxides and nitrides,” Pure Appl. Chem. 66, 1311–1318 (1994). [CrossRef]
  13. E. Palik and G. Ghosh, Handbook of Optical Constants of Solids (Academic, 1998).
  14. I. Malitson, “Interspecimen comparison of the refractive index of fused silica,” J. Opt. Soc. Am. 55, 1205–1208 (1965). [CrossRef]
  15. T. Bååk, “Silicon oxynitride; a material for grin optics,” Appl. Opt. 21, 1069–1072 (1982). [CrossRef]
  16. S. I. Lee, S. G. Rhee, and S. G. Oh, “Spectro-ellipsometric studies of sputtered amorphous titanium dioxide thin films: Simultaneous determination of refractive index, extinction coefficient, and void distribution,” J. Korean Phys. Soc. 34, 319–322 (1999). [CrossRef]
  17. S. Schiller, G. Beister, W. Sieber, G. Schirmer, and E. Hacker, “Influence of deposition parameters on the optical and structural properties of TiO2 films produced by reactive d.c. plasmatron sputtering,” Thin Solid Films 83, 239–245 (1981). [CrossRef]
  18. M. Bass, ed., Handbook of Optics (McGraw-Hill, 2001).
  19. K. S. Shamala, L. C. S. Murthy, and K. N. Rao, “Studies on optical and dielectric properties of Al2O3 thin films prepared by electron beam evaporation and spray pyrolysis method,” Mater. Sci. Eng. B 106, 269–274 (2004). [CrossRef]
  20. A. D. Rakić, “Algorithm for the determination of intrinsic optical constants of metal films: Application to aluminum,” Appl. Opt. 34, 4755–4767 (1995). [CrossRef]
  21. C. Dohmeier, D. Loos, and H. Schnoeckel, “Aluminum (I) and gallium (I) compounds: Syntheses, structures, and reactions,” Angew. Chem. Int. Ed. 35, 129–149 (1996). [CrossRef]
  22. D. Tyte, “Red (B2Π−A2σ) band system of aluminium monoxide,” Nature 202, 383–384 (1964). [CrossRef]
  23. J. M. Khoshman and M. E. Kordesch, “Optical characterization of sputtered amorphous aluminum nitride thin films by spectroscopic ellipsometry,” J. Non-Cryst. Solids 351, 3334–3340 (2005). [CrossRef]
  24. J. Harper, J. Cuomo, and H. Hentzell, “Synthesis of compound thin films by dual ion beam deposition. I. Experimental approach,” J. Appl. Phys. 58, 550–555 (1985). [CrossRef]

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.


« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited