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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 51, Iss. 28 — Oct. 1, 2012
  • pp: 6839–6843

Porous anodic alumina with low refractive index for broadband graded-index antireflection coatings

Junwu Chen, Biao Wang, Yi Yang, Yuanyuan Shi, Gaojie Xu, and Ping Cui  »View Author Affiliations


Applied Optics, Vol. 51, Issue 28, pp. 6839-6843 (2012)
http://dx.doi.org/10.1364/AO.51.006839


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Abstract

Materials with very low refractive index are essential to prepare broadband graded-index antireflection (AR) coatings. However, the availability of such materials is very limited. In this study, large-area (4cm×4cm) low refractive index porous anodic alumina (PAA) coatings on glass substrate were prepared successfully by electron-beam evaporation, electrochemical oxidation, and chemical etching method. The nanopore size of PAA film is smaller than 40 nm, and the refractive index of PAA film is n=1.08. Besides, five-layered graded-index broadband PAA coatings with refractive indices following the Gaussian profile were also prepared to noticeably eliminate the reflectance of glass over a broadband wavelength, and the lowest reflectivity is 0.64% at the wavelength of 534 nm at normal incidence. The PAA AR coatings having an omnidirectional nature are likely to have practical applications in photovoltaic cells and optical devices.

© 2012 Optical Society of America

OCIS Codes
(310.1210) Thin films : Antireflection coatings
(310.6860) Thin films : Thin films, optical properties
(310.4165) Thin films : Multilayer design
(220.4241) Optical design and fabrication : Nanostructure fabrication

ToC Category:
Thin Films

History
Original Manuscript: July 2, 2012
Revised Manuscript: August 29, 2012
Manuscript Accepted: September 3, 2012
Published: September 27, 2012

Citation
Junwu Chen, Biao Wang, Yi Yang, Yuanyuan Shi, Gaojie Xu, and Ping Cui, "Porous anodic alumina with low refractive index for broadband graded-index antireflection coatings," Appl. Opt. 51, 6839-6843 (2012)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-51-28-6839


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References

  1. J. A. Dobrowolski, D. Poitras, P. Ma, H. Vakil, and M. Acree, “Toward perfect antireflection coatings: numerical investigation,” Appl. Opt. 41, 3075–3083 (2002). [CrossRef]
  2. D. Poitras, and J. A. Dobrowolski, “Toward perfect antireflection coatings. 2. Theory,” Appl. Opt. 43, 1286–1295 (2004). [CrossRef]
  3. B. Päivänranta, T. Saastamoinen, and M. Kuittinen, “A wide-angle antireflection surface for the visible spectrum,” Nanotechnology 20, 375301 (2009). [CrossRef]
  4. G. M. Wu, J. Wang, J. Shen, T. H. Yang, Q. Y. Zhang, B. Zhou, Z. S. Deng, B. Fan, D. P. Zhou, and F. S. Zhang, “Preparation and properties of scratch-resistant nano porous broadband AR silica films derived by a two-step catalytic sol-gel process,” Proc. SPIE 4086, 807–810 (2000). [CrossRef]
  5. H. Park, D. Shin, G. Kang, S. Baek, K. Kim, and W. J. Padilla, “Broadband optical antireflection enhancement by integrating antireflective nanoislands with silicon nanoconical-frustum arrays,” Adv. Mater. 23, 5796–5800 (2011). [CrossRef]
  6. Y. J. Hung, S. L. Lee, K. C. Wu, Y. Tai, and Y. T. Pan, “Antireflective silicon surface with vertical-aligned silicon nanowires realized by simple wet chemical etching processes,” Opt. Express 19, 15792–15802 (2011). [CrossRef]
  7. J. Q. Xi, M. F. Schubert, J. K. Kim, E. F. Schubert, M. Chen, S. Y. Lin, W. Liu, and J. A. Smart, “Optical thin-film materials with low refractive index for broadband elimination of Fresnel reflection,” Nat. Photon. 1, 176–179 (2007). [CrossRef]
  8. M. L. Kuo, D. J. Poxson, Y. S. Kim, F. W. Mont, J. K. Kim, E. F. Schubert, and S. Y. Lin, “Realization of a near-perfect antireflection coating for silicon solar energy utilization,” Opt. Lett. 33, 2527–2529 (2008). [CrossRef]
  9. J. W. Diggle, T. C. Downie, and C. W. Goulding, “Anodic oxide films on aluminum,” Chem. Rev. 69, 365–405 (1969). [CrossRef]
  10. N. L. Kovtyukhova and, and T. E. Mallouk, “Nanowire p-nheterojunction diodes made by templated assembly of multilayer carbon-nanotube/polymer/semiconductor-particle shells around metal nanowires,” Adv. Mater. 17, 187–192 (2005). [CrossRef]
  11. K. Nielsch, F. Muller, A. P. Li, and U. Gosele, “Uniform nickel deposition into ordered alumina pores by pulsed electrode position,” Adv. Mater. 12, 582–586 (2000). [CrossRef]
  12. X. Mei, D. Kim, H. E. Ruda, and Q. X. Guo, “Molecular-beam epitaxial growth of GaAs and InGaAs/GaAs nanodot arrays using anodic Al2O3 nanohole array template masks,” Appl. Phys. Lett. 81, 361–363 (2002). [CrossRef]
  13. M. F. Chen, H. C. Chang, A. S. P. Chang, S. Y. Lin, J. Q. Xi, and E. F. Schubert, “Design of optical path for wide-angle gradient-index antireflection coatings,” Appl. Opt. 46, 6533–6538 (2007). [CrossRef]

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