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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 51, Iss. 28 — Oct. 1, 2012
  • pp: 6844–6847

Study on the absorption uniformity of optical thin films based on the photothermal detuning technique

Honggang Hao, Ao Zhou, and Min Rao  »View Author Affiliations

Applied Optics, Vol. 51, Issue 28, pp. 6844-6847 (2012)

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Absorption loss in optical components, particularly in optical coatings, is a limiting factor in high-power laser applications. The uniformity of optical coatings becomes more and more important as large-diameter optical devices are used widely. In this paper, the photothermal detuning technique used for absorption uniformity measurement of optical thin films is developed for the first time. Experiments are conducted with a highly reflective coating used in 514 nm to measure the photothermal detuning signal and to evaluate the absorption at 514 nm by detecting the spectral shift with a probe beam at a wavelength of 632.8 nm. The relative absorption at different points on the sample surface can be measured by moving the sample two-dimensionally, and we use the measured data to make the absorption image. The results show that the designed experimental system can be used to analyze the absorption uniformity of optical coatings. The obtained images reflect the absorption uniformity of the sample well. The absorption uniformities of the two samples analyzed in this experiment are different. The film coated on fused silica is better. The research provides a powerful and convenient tool for absorption uniformity measurement of optical thin film.

© 2012 Optical Society of America

OCIS Codes
(300.1030) Spectroscopy : Absorption
(310.1620) Thin films : Interference coatings
(350.5340) Other areas of optics : Photothermal effects

ToC Category:
Thin Films

Original Manuscript: July 12, 2012
Manuscript Accepted: August 27, 2012
Published: September 27, 2012

Honggang Hao, Ao Zhou, and Min Rao, "Study on the absorption uniformity of optical thin films based on the photothermal detuning technique," Appl. Opt. 51, 6844-6847 (2012)

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  1. B. Cimma, D. Forest, P. Ganau, B. Lagrange, J.-M. Mackowski, C. Michel, J.-L. Montorio, N. Morgado, R. Pignard, L. Pinard, and A. Remillieux, “Ion beam sputtering coatings on large substrates toward an improvement of the mechanical and optical performances,” Appl. Opt. 45, 1436–1439 (2006). [CrossRef]
  2. S. Li, H. He, D. Li, M. Zhou, X. Ling, Y. Zhao, and Z. Fan, “Temperature field analysis of TiO2 films with high-absorptance inclusions,” Appl. Opt. 49, 329–333 (2010). [CrossRef]
  3. B. Li, H. Blaschke, and D. Ristau, “Combined laser calorimetry and photothermal technique for absorption measurement of optical coatings,” Appl. Opt. 45, 5827–5831 (2006). [CrossRef]
  4. Z. L. Wu, M. Thomsen, P. K. Kuo, Y. Lu, C. Stolz, and M. Kozlowski, “Photothermal characterization of optical thin film coatings,” Opt. Eng. 36, 251–262 (1997). [CrossRef]
  5. L. Gallais and M. Commandré, “Photothermal deflection in multilayer coatings: modeling and experiment,” Appl. Opt. 44, 5230–5238 (2005). [CrossRef]
  6. X. Chen, B. Li, and Y. Yang, “Theory of surface thermal lens signal in optical coating with cw modulated top-hat beam excitation,” Acta Phys. Sin. 55, 4673–4678 (2006), in Chinese.
  7. S. Li, H. He, Y. Shao, D. Li, Y. Zhao, and Z. Fan, “Enhanced surface thermal lensing for absorption evaluation and defect identification of optical films,” Appl. Opt. 49, 2417–2421 (2010). [CrossRef]
  8. H. Hao and B. Li, “Photothermal detuning: a sensitive technique for absorption measurement of optical thin films,” Proc. SPIE 6720, 67201D (2007). [CrossRef]
  9. H. Hao and B. Li, “Photothermal detuning for absorption measurement of optical coatings,” Appl. Opt. 47, 188–194 (2008). [CrossRef]
  10. S.-H. Kim and C. K. Hwangbo, “Derivation of the center-wavelength shift of narrow-bandpass filters under temperature change,” Opt. Express 12, 5634–5639 (2004). [CrossRef]
  11. T.-C. Chen, J.-I. Kuo, W.-L. Lee, and C.-C. Lee, “Influences of temperature and stress on transmission characteristics of multilayer thin-film narrow bandpass filters,” Jpn. J. Appl. Phys. 40, 4087–4096 (2001). [CrossRef]
  12. E. Drouard, P. Huguet-Chantôme, L. Escoubas, and F. Flory, “∂n/∂T Measurements performed with guided waves and their application to the temperature sensitivity of wavelength-division multiplexing filters,” Appl. Opt. 41, 3132–3136 (2002). [CrossRef]

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