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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 51, Iss. 33 — Nov. 20, 2012
  • pp: 8052–8056

Cost-effective large-scale fabrication of diffractive optical elements by using conventional semiconducting processes

Seunghwan Yoo, Ho Young Song, Junghoon Lee, Cheol-Yong Jang, and Hakgeun Jeong  »View Author Affiliations

Applied Optics, Vol. 51, Issue 33, pp. 8052-8056 (2012)

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In this article, we introduce a simple fabrication method for SiO2-based thin diffractive optical elements (DOEs) that uses the conventional processes widely used in the semiconductor industry. Photolithography and an inductively coupled plasma etching technique are easy and cost-effective methods for fabricating subnanometer-scale and thin DOEs with a refractive index of 1.45, based on SiO2. After fabricating DOEs, we confirmed the shape of the output light emitted from the laser diode light source and applied to a light-emitting diode (LED) module. The results represent a new approach to mass-produce DOEs and realize a high-brightness LED module.

© 2012 Optical Society of America

OCIS Codes
(140.0140) Lasers and laser optics : Lasers and laser optics
(350.4600) Other areas of optics : Optical engineering
(050.1965) Diffraction and gratings : Diffractive lenses
(130.3990) Integrated optics : Micro-optical devices

ToC Category:
Integrated Optics

Original Manuscript: August 27, 2012
Manuscript Accepted: October 22, 2012
Published: November 20, 2012

Seunghwan Yoo, Ho Young Song, Junghoon Lee, Cheol-Yong Jang, and Hakgeun Jeong, "Cost-effective large-scale fabrication of diffractive optical elements by using conventional semiconducting processes," Appl. Opt. 51, 8052-8056 (2012)

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