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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 51, Iss. 36 — Dec. 20, 2012
  • pp: 8549–8556

Polarimetric characterization of bismuth thin films deposited by laser ablation

Rafael Espinosa-Luna, Enrique Camps, Dagoberto Cardona, and Elder De la Rosa  »View Author Affiliations


Applied Optics, Vol. 51, Issue 36, pp. 8549-8556 (2012)
http://dx.doi.org/10.1364/AO.51.008549


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Abstract

A Mueller–Stokes analysis is applied to pure bismuth thin film samples prepared by the laser ablation technique by using a polarimeter with a 632.8 nm continuum wavelength laser. The complex refractive index is determined in the range of 250–1100 nm. Results from the Mueller matrix show the high sensitivity of diattenuation and polarizance parameters as a function of the sample thickness and the incidence angle, except at the pseudo-Brewster angle, where they exhibit the same value. Results show that the knowledge of the polarimetric response, with appropriate incident polarization states, could be used to design photonic Bi-based devices for several applications. Polarization dependence is the result of changes on the surface morphology as a result of the small value of the skin depth.

© 2012 Optical Society of America

OCIS Codes
(160.4760) Materials : Optical properties
(310.6860) Thin films : Thin films, optical properties
(310.5448) Thin films : Polarization, other optical properties

ToC Category:
Thin Films

History
Original Manuscript: August 23, 2012
Revised Manuscript: November 12, 2012
Manuscript Accepted: November 16, 2012
Published: December 13, 2012

Citation
Rafael Espinosa-Luna, Enrique Camps, Dagoberto Cardona, and Elder De la Rosa, "Polarimetric characterization of bismuth thin films deposited by laser ablation," Appl. Opt. 51, 8549-8556 (2012)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-51-36-8549


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