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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 52, Iss. 24 — Aug. 20, 2013
  • pp: 5979–5984

Laser beam diffraction at the edge of a film and application to thin film metrology

P. A. Do, M. Touaibia, and A. Haché  »View Author Affiliations


Applied Optics, Vol. 52, Issue 24, pp. 5979-5984 (2013)
http://dx.doi.org/10.1364/AO.52.005979


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Abstract

The thickness change of a film is measured optically using self-interference of a single laser beam incident at the edge of the film. Theory suggests that when a half-plane phase shift is applied to a Gaussian laser beam, interference fringes appear in the near and far field, in which position varies with the amount of phase shift. By measuring fringe pattern displacement, we demonstrate detection of thickness changes in chitosan films induced by temperature rises of a few degrees centigrade. With a laser at 543 nm, the minimum detectable thickness change is 0.8 nm in ideal conditions (quarter wave films), corresponding with a phase shift of 0.02 rad, and the minimum detectable film thickness is 30nm. Potential use for surface temperature measurements is discussed.

© 2013 Optical Society of America

OCIS Codes
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(240.0240) Optics at surfaces : Optics at surfaces
(240.0310) Optics at surfaces : Thin films
(310.6870) Thin films : Thin films, other properties

ToC Category:
Optics at Surfaces

History
Original Manuscript: May 28, 2013
Revised Manuscript: July 19, 2013
Manuscript Accepted: July 24, 2013
Published: August 15, 2013

Citation
P. A. Do, M. Touaibia, and A. Haché, "Laser beam diffraction at the edge of a film and application to thin film metrology," Appl. Opt. 52, 5979-5984 (2013)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-52-24-5979

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