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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 52, Iss. 29 — Oct. 10, 2013
  • pp: 7137–7144

Grouping design of eight-mirror projection objective for high-numerical aperture EUV lithography

Fei Liu and Yanqiu Li  »View Author Affiliations

Applied Optics, Vol. 52, Issue 29, pp. 7137-7144 (2013)

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A grouping design method for all-sphere initial design of an eight-mirror projection objective is proposed for extreme ultraviolet lithography (EUVL). By separating the eight-mirror objective into three mirror groups (the object side group, the image side group, the middle group), this method allows designers to calculate the parameters of an eight-mirror objective by the nonobstruction constraints and the conjugation relationships of object image and pupils. Exhaustive paraxial search for the middle group is implemented while a designer-chosen combination of object side group and image side group is considered. The grouping design process is visualized and steerable. The load of calculation is well controlled in a practical acceptable span. The final eight-mirror design optimized with aspheric parameters achieves an 0.4 numerical aperture on the image side, and the image resolution achieves a diffraction limit with almost no distortion.

© 2013 Optical Society of America

OCIS Codes
(220.2740) Optical design and fabrication : Geometric optical design
(220.3740) Optical design and fabrication : Lithography
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
(080.2468) Geometric optics : First-order optics

ToC Category:
Geometric Optics

Original Manuscript: July 25, 2013
Revised Manuscript: September 5, 2013
Manuscript Accepted: September 7, 2013
Published: October 7, 2013

Fei Liu and Yanqiu Li, "Grouping design of eight-mirror projection objective for high-numerical aperture EUV lithography," Appl. Opt. 52, 7137-7144 (2013)

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