OSA's Digital Library

Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 52, Iss. 29 — Oct. 10, 2013
  • pp: 7137–7144

Grouping design of eight-mirror projection objective for high-numerical aperture EUV lithography

Fei Liu and Yanqiu Li  »View Author Affiliations


Applied Optics, Vol. 52, Issue 29, pp. 7137-7144 (2013)
http://dx.doi.org/10.1364/AO.52.007137


View Full Text Article

Enhanced HTML    Acrobat PDF (933 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

A grouping design method for all-sphere initial design of an eight-mirror projection objective is proposed for extreme ultraviolet lithography (EUVL). By separating the eight-mirror objective into three mirror groups (the object side group, the image side group, the middle group), this method allows designers to calculate the parameters of an eight-mirror objective by the nonobstruction constraints and the conjugation relationships of object image and pupils. Exhaustive paraxial search for the middle group is implemented while a designer-chosen combination of object side group and image side group is considered. The grouping design process is visualized and steerable. The load of calculation is well controlled in a practical acceptable span. The final eight-mirror design optimized with aspheric parameters achieves an 0.4 numerical aperture on the image side, and the image resolution achieves a diffraction limit with almost no distortion.

© 2013 Optical Society of America

OCIS Codes
(220.2740) Optical design and fabrication : Geometric optical design
(220.3740) Optical design and fabrication : Lithography
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
(080.2468) Geometric optics : First-order optics

ToC Category:
Geometric Optics

History
Original Manuscript: July 25, 2013
Revised Manuscript: September 5, 2013
Manuscript Accepted: September 7, 2013
Published: October 7, 2013

Citation
Fei Liu and Yanqiu Li, "Grouping design of eight-mirror projection objective for high-numerical aperture EUV lithography," Appl. Opt. 52, 7137-7144 (2013)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-52-29-7137


Sort:  Author  |  Year  |  Journal  |  Reset  

References

  1. M. Lowisch, P. Kuerz, O. Conradi, G. Wittich, W. Seitz, and W. Kaiser, “Optics for ASML’s NXE:3300B platform,” Proc. SPIE 8679, 86791H (2013). [CrossRef]
  2. H.-J. Mann and W. Ulrich, “Reflective high-NA projection lenses,” Proc. SPIE 5962, 596214 (2005). [CrossRef]
  3. H.-J. Mann, W. Ultrich, and G. Seitz, “8-mirror microlithography projection objective,” U.S. patent6,710,917 (March23, 2004), p. B2.
  4. T. Takahashi, “Reflection-type projection-optical systems, and exposure apparatus comprising same,” U.S. patent2007/0223119 (Sept.27, 2007), p. A1.
  5. M. F. Bal, “Next-generation extreme ultraviolet lithographic projection,” Ph.D. Thesis (Delft University of Technology, 2003).
  6. O. E. Marinescu, “Novel design methods for high-quality lithographic objectives,” Ph.D. Thesis (Delft University of Technology, 2006).
  7. R. Hudyma, H.-J. Mann, and U. Dinger, “Projection system for EUV lithography,” U.S. patent2007/0153252 (July5, 2007), p. A1.
  8. F. Liu and Y. Li, “Design of multi-mirror optics for industrial extreme ultraviolet lithography,” Opt. Rev. 20(2), 120–126 (2013). [CrossRef]

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.


« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited