OSA's Digital Library

Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 52, Iss. 36 — Dec. 20, 2013
  • pp: 8644–8649

Sub-sampling low coherence scanning interferometry and its application: refractive index measurements of a silicon wafer

Ki-Nam Joo  »View Author Affiliations

Applied Optics, Vol. 52, Issue 36, pp. 8644-8649 (2013)

View Full Text Article

Enhanced HTML    Acrobat PDF (769 KB)

Browse Journals / Lookup Meetings

Browse by Journal and Year


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools



In this investigation, refractive indices of a silicon (Si) wafer were measured by low-coherence scanning interferometry adopting the sub-sampling technique to reduce measurement time. Based on Fourier domain analysis method, the sub-sampled correlogram was analyzed and the refractive indices were calculated by the simple refractive index model and curve fitting of the phase extracted from the sub-sampled correlogram. In the experiment to verify the proposed technique, near-infrared light emitted by a super-luminescent diode with 1050 nm center wavelength was used as an optical source because it is partially transparent to an undoped Si wafer. As the result of measuring an undoped double-side polished Si wafer, group and phase refractive indices were successfully obtained with the sub-sampled correlogram, and the deviations from the reference value were within 0.001.

© 2013 Optical Society of America

OCIS Codes
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.3940) Instrumentation, measurement, and metrology : Metrology
(120.4640) Instrumentation, measurement, and metrology : Optical instruments
(120.4825) Instrumentation, measurement, and metrology : Optical time domain reflectometry

ToC Category:
Instrumentation, Measurement, and Metrology

Original Manuscript: September 12, 2013
Revised Manuscript: November 3, 2013
Manuscript Accepted: November 18, 2013
Published: December 11, 2013

Ki-Nam Joo, "Sub-sampling low coherence scanning interferometry and its application: refractive index measurements of a silicon wafer," Appl. Opt. 52, 8644-8649 (2013)

Sort:  Author  |  Year  |  Journal  |  Reset  


  1. L. Deck and P. de Groot, “High-speed noncontact profiler based on scanning white-light interferometry,” Appl. Opt. 33, 7334–7338 (1994). [CrossRef]
  2. P. Sandoz, R. Devillers, and A. Plata, “Unambiguous profilometry by fringe-order identification in white-light phase-shifting interferometry,” J. Mod. Opt. 44, 519–534 (1997). [CrossRef]
  3. P. de Groot and L. Deck, “Three-dimensional imaging by sub-Nyquist sampling of white-light interferograms,” Opt. Lett. 18, 1462–1464 (1993). [CrossRef]
  4. M. Galli, F. Marabelli, and G. Guizzetti, “Direct measurement of refractive-index dispersion of transparent media by white-light interferometry,” Appl. Opt. 42, 3910–3914 (2003). [CrossRef]
  5. H. Maruyama, S. Inoue, T. Mitsuyama, M. Ohmi, and M. Haruna, “Low-coherence interferometer system for the simultaneous measurement of refractive index and thickness,” Appl. Opt. 41, 1315–1322 (2002). [CrossRef]
  6. S. H. Kim, S. H. Lee, J. I. Lim, and K. H. Kim, “Absolute refractive index measurement method over a broad wavelength region based on white-light interferometry,” Appl. Opt. 49, 910–914 (2010). [CrossRef]
  7. K.-N. Joo and S.-W. Kim, “Refractive index measurement by spectrally resolved interferometry using a femtosecond pulse laser,” Opt. Lett. 32, 647–649 (2007). [CrossRef]
  8. M. Haruna, M. Ohmi, T. Mitsuyama, H. Tajiri, H. Maruyama, and M. Hashimoto, “Simultaneous measurement of the phase and group indices and the thickness of transparent plates by low-coherence interferometry,” Opt. Lett. 23, 966–968 (1998). [CrossRef]
  9. Y. G. Kim, Y. B. Seo, and K.-N. Joo, “Low cost wafer metrology using a NIR low coherence interferometry,” Opt. Express 21, 13648–13655 (2013). [CrossRef]
  10. B. Tatian, “Fitting refractive-index data with the Sellmeier dispersion formula,” Appl. Opt. 23, 4477–4485 (1984). [CrossRef]
  11. M. A. Green, “Self-consistent optical parameters of intrinsic silicon at 300  K including temperature coefficients,” Sol. Energy Mater. Sol. Cells 92, 1305–1310 (2008). [CrossRef]
  12. J. Schmit and A. Olszak, “High-precision shape measurement by white-light interferometry with real-time scanner error correction,” Appl. Opt. 41, 5943–5950 (2002). [CrossRef]
  13. M. Ohmi, Y. Ohnishi, K. Yoden, and M. Haruna, “In vitro simultaneous measurement of refractive index and thickness of biological tissue by the low coherence interferometry,” IEEE Trans. Biomed. Eng. 47, 1266–1270 (2000). [CrossRef]
  14. T. Fukano and I. Yamaguchi, “Simultaneous measurement of thicknesses and refractive indices of multiple layers by a low-coherence confocal interference microscope,” Opt. Lett. 21, 1942–1944 (1996). [CrossRef]
  15. A. Hirai and H. Matsumoto, “Low-coherence tandem interferometer for measurement of group refractive index without knowledge of the thickness of the test sample,” Opt. Lett. 28, 2112–2114 (2003). [CrossRef]

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited