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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 52, Iss. 4 — Feb. 1, 2013
  • pp: 849–853

Generation of a strong uniform transversely polarized nondiffracting beam using a high-numerical-aperture lens axicon with a binary phase mask

P. Suresh, C. Mariyal, K. B. Rajesh, T. V. S. Pillai, and Z. Jaroszewicz  »View Author Affiliations


Applied Optics, Vol. 52, Issue 4, pp. 849-853 (2013)
http://dx.doi.org/10.1364/AO.52.000849


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Abstract

We present a theoretical approach to generate a nondiffracting beam with extended depth of focus (DOF) and a smaller focal spot along the optical axis, by tight focusing of an azimuthally polarized beam with a circular symmetrical binary phase mask and an interference effect over a high-numerical-aperture (NA) lens axicon system. We find a general azimuthal diffraction integral for the circularly symmetric binary phase mask and examine it in two special cases: a high-NA lens and a high-NA lens axicon. The azimuthally polarized beam remains well behaved in both cases. We verify that the longitudinal component generated by azimuthally polarized illumination produces the narrowest spot size for a wide range of geometries. Finally, we discuss the effects of tight focusing on a dielectric interface and provide some ideas for circumventing the effects of the binary phase mask interface and even utilize them for spot size reduction.

© 2013 Optical Society of America

OCIS Codes
(210.0210) Optical data storage : Optical data storage
(260.0260) Physical optics : Physical optics
(260.1960) Physical optics : Diffraction theory
(260.5430) Physical optics : Polarization

ToC Category:
Optical Design and Fabrication

History
Original Manuscript: October 1, 2012
Manuscript Accepted: January 3, 2013
Published: February 1, 2013

Citation
P. Suresh, C. Mariyal, K. B. Rajesh, T. V. S. Pillai, and Z. Jaroszewicz, "Generation of a strong uniform transversely polarized nondiffracting beam using a high-numerical-aperture lens axicon with a binary phase mask," Appl. Opt. 52, 849-853 (2013)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-52-4-849

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