OSA's Digital Library

Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 52, Iss. 7 — Mar. 1, 2013
  • pp: 1512–1516

Broadband thin-film polarizers for high-power laser systems

Jinlong Zhang, Yujiang Xie, Xinbin Cheng, Tao Ding, and Zhanshan Wang  »View Author Affiliations


Applied Optics, Vol. 52, Issue 7, pp. 1512-1516 (2013)
http://dx.doi.org/10.1364/AO.52.001512


View Full Text Article

Enhanced HTML    Acrobat PDF (643 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

We propose to construct broadband thin-film polarizers (TFPs) by combining the polarizing regions of long-wave pass and short-wave pass stacks. The polarization bandwidth can be broader than traditional TFPs by roughly a factor of 2. We designed and fabricated two HfO2/SiO2 Brewster’s angle TFPs with a high contrast ratio in the spectral range of 1064±25nm. The laser-induced damage was investigated and illustrates that the two designs possess quite different laser damage properties due to the different electric field distributions. Nevertheless, broadband TFPs with high laser-induced damage threshold can be achieved with proper coating design.

© 2013 Optical Society of America

OCIS Codes
(140.3330) Lasers and laser optics : Laser damage
(310.6860) Thin films : Thin films, optical properties
(310.5448) Thin films : Polarization, other optical properties

ToC Category:
Thin Films

History
Original Manuscript: December 5, 2012
Revised Manuscript: January 30, 2013
Manuscript Accepted: January 30, 2013
Published: February 28, 2013

Citation
Jinlong Zhang, Yujiang Xie, Xinbin Cheng, Tao Ding, and Zhanshan Wang, "Broadband thin-film polarizers for high-power laser systems," Appl. Opt. 52, 1512-1516 (2013)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-52-7-1512


Sort:  Author  |  Year  |  Journal  |  Reset  

References

  1. C. Fournet, B. Pinot, B. Geenen, F. Ollivier, and W. Alexandre, “High damage threshold mirrors and polarizers in the ZrO2/SiO2 and HfO2/SiO2 dielectric systems,” Proc. SPIE 1624, 282–293 (1991). [CrossRef]
  2. P. F. Gu and J. F. Tang, “Laser-induced damage resistance of thin-film polarizers prepared by ion-assisted deposition,” Opt. Lett. 19, 81–83 (1994). [CrossRef]
  3. C. J. Stolz, F. Y. Genin, T. A. Reitter, N. Molau, R. P. Bevis, M. K. von Gunten, D. J. Smith, and J. F. Anzellotti, “Effect of SiO2 overcoat thickness on laser damage morphology of HfO2/SiO2 Brewster’s angle polarizers at 1064 nm,” Proc. SPIE 2966, 265–272 (1997). [CrossRef]
  4. F. Y. Genin, C. J. Stolz, T. Reitter, M. R. Kozlowski, R. P. Bevis, and M. K. von Gunten, “Effect of electric field distribution on the morphologies of laser-induced damage in hafnia-silica multilayer polarizers,” Proc. SPIE 2966, 342–352 (1997). [CrossRef]
  5. C. J. Stolz, “Brewster’s angle thin film plate polarizer design study from an electric field perspective,” Proc. SPIE 3738, 347–353 (1999). [CrossRef]
  6. C. J. Stolz, “Status of NIF mirror technologies for completion of the NIF facility,” Proc. SPIE 7101, 710115 (2008). [CrossRef]
  7. M. Zhu, K. Yi, Z. Fan, and J. Shao, “Theoretical and experimental research on spectral performance and laser induced damage of Brewster’s thin film polarizers,” Appl. Surf. Sci. 257, 6884–6888 (2011). [CrossRef]
  8. L. J. Waxer, D. N. Maywar, J. H. Kelly, T. J. Kessler, B. E. Kruschwitz, S. J. Loucks, R. L. McCrory, D. D. Meyerhofer, S. F. B. Morse, C. Stoeckl, and J. D. Zuegel, “High-energy petawatt capability for the OMEGA laser,” Opt. Photonics News 16(7), 30–36 (2005). [CrossRef]
  9. J. D. Kmetec, J. J. Macklin, and J. F. Young, “0.5TW, 125 fs Ti:sapphire laser,” Opt. Lett. 16, 1001–1003 (1991). [CrossRef]
  10. J. A. Dobrowolski, “Optical properties of films and coatings,” in Handbook of Optics, M. Bass ed. (McGraw-Hill, 2010), pp. 7.69–7.73.
  11. J. B. Oliver, A. L. Rigatti, J. D. Howe, J. Keck, J. Szczepanski, A. W. Schmid, S. Papernov, A. Kozlov, and T. Z. Kosc, “Thin-film polarizers for the OMEGA EP laser system,” Proc. SPIE 5991, 599119 (2005). [CrossRef]
  12. H. F. Mahlein, “Generalized Brewster-angle condition for quarter-wave multilayers at non-normal incidence,” J. Opt. Soc. Am. 64, 647–653 (1974). [CrossRef]
  13. A. Thelen, “Avoidance or enhancement of polarization in multilayers,” J. Opt. Soc. Am. 70, 118–121 (1980). [CrossRef]
  14. D. M. A. Aminou and J. Squier, “Broad band thin film plate polarizer for high power femtosecond solid-state lasers,” in Advanced Solid State Lasers, Vol. 15 of OSA Trends in Optics and Photonics Series (Optical Society of America, 1993), pp. 212–215.
  15. A. V. Tikhonravov and M. K. Trubetskov, Optilayer Thin Film Software, http://www.optilayer.com .
  16. X. Cheng, Z. Shen, H. Jiao, J. Zhang, B. Ma, T. Ding, J. Lu, X. Wang, and Z. Wang, “Laser damage study of nodules in electron-beam-evaporated HfO2/SiO2 high reflectors,” Appl. Opt. 50, C357–C363 (2011). [CrossRef]
  17. B. Ma, T. Ding, H. Jiao, G. Zhou, Z. Shen, X. Cheng, J. Zhang, H. Liu, Y. Ji, P. He, and Z. Wang, “LIDT of HfO2/SiO2 HR films by different test modes at 1064 nm and 532 nm,” Proc. SPIE 7842, 78420E (2010). [CrossRef]
  18. C. J. Stolz, M. D. Thomas, and A. J. Griffin, “BDS thin film damage competition,” Proc. SPIE 7132, 71320C(2010). [CrossRef]
  19. S. Papernov and A. W. Schmid, “High-spatial-resolution studies of UV-laser-damage morphology in SiO2 thin films with artificial defects,” Proc. SPIE 5647, 141–155 (2005). [CrossRef]

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.


« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited