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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 53, Iss. 18 — Jun. 20, 2014
  • pp: 3866–3874

Pixel-based defect detection from high-NA optical projection images

Dongbo Xu, Tim Fühner, and Andreas Erdmann  »View Author Affiliations

Applied Optics, Vol. 53, Issue 18, pp. 3866-3874 (2014)

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The reconstruction of subwavelength defects from measured images of high-NA-projection systems is demonstrated. A structure consisting of a few small unknown defects in an otherwise known mask layout is studied. The footprint of the defect, which is the measured or simulated difference between images of masks with and without defects, is used to reconstruct the position, shape, and transmission of defects. The requirement is that the few unknown defects are sparsely located in the known mask layout. The technique relies on the cost function and an appropriate optimizer. The dependency of the reconstruction results on defect sizes and types of defects is presented. Moreover, the sensitivity of the technique to noise is investigated.

© 2014 Optical Society of America

OCIS Codes
(100.3190) Image processing : Inverse problems
(220.3740) Optical design and fabrication : Lithography
(330.1880) Vision, color, and visual optics : Detection
(110.3010) Imaging systems : Image reconstruction techniques

ToC Category:
Imaging Systems

Original Manuscript: February 21, 2014
Revised Manuscript: April 29, 2014
Manuscript Accepted: May 14, 2014
Published: June 13, 2014

Dongbo Xu, Tim Fühner, and Andreas Erdmann, "Pixel-based defect detection from high-NA optical projection images," Appl. Opt. 53, 3866-3874 (2014)

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