Abstract
crystals were implanted by C ions and O ions at an energy of 6.0 MeV with a fluence of . The profiles of the guided modes were measured through prism coupling and end-face coupling methods with a 633 nm laser source. A nonleaky waveguide structure in the TM mode was fabricated by O ion implantation after a proper annealing treatment. Characteristics of the implanted C and O ions were compared. Some changes of the full width at half of the maximum and intensity of the Raman spectra were observed between the waveguide and substrate regions in crystals. Thus, the Raman spectra can be used to visualize any damage or defects in the crystals during the implantation process.
© 2014 Optical Society of America
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