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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 53, Iss. 4 — Feb. 1, 2014
  • pp: A197–A204

Scattering reduction through oblique multilayer deposition

Marcus Trost, Tobias Herffurth, Sven Schröder, Angela Duparré, and Andreas Tünnermann  »View Author Affiliations

Applied Optics, Vol. 53, Issue 4, pp. A197-A204 (2014)

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Scattering from multilayer coatings depends on the roughness of each interface as well as their cross-correlation properties. By depositing thin film coatings under oblique incidence, the cross-correlation properties can be specifically adapted and consequently also the scattering characteristics. This will be illustrated for Mo/Si multilayers, for which a scattering reduction of more than 30% can be achieved. The characterization techniques used comprise of cross-sectional transmission electron microscopy, atomic force microscopy, and angle-resolved light scattering measurements at a wavelength of 13.5 nm.

© 2013 Optical Society of America

OCIS Codes
(290.0290) Scattering : Scattering
(310.6860) Thin films : Thin films, optical properties
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)

Original Manuscript: August 30, 2013
Revised Manuscript: November 11, 2013
Manuscript Accepted: November 11, 2013
Published: December 19, 2013

Marcus Trost, Tobias Herffurth, Sven Schröder, Angela Duparré, and Andreas Tünnermann, "Scattering reduction through oblique multilayer deposition," Appl. Opt. 53, A197-A204 (2014)

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  1. M. Trost, S. Schröder, T. Feigl, A. Duparré, and A. Tünnermann, “Influence of the substrate finish and thin film roughness on the optical performance of Mo/Si multilayers,” Appl. Opt. 50, C148–C153 (2011). [CrossRef]
  2. S. Schröder, T. Feigl, A. Duparré, and A. Tünnermann, “EUV reflectance and scattering of Mo/Si multilayers on differently polished substrates,” Opt. Express 15, 13997–14012 (2007). [CrossRef]
  3. J. H. Apfel, “Optical coating design with reduced electric field intensity,” Appl. Opt. 16, 1880–1885 (1977). [CrossRef]
  4. C. Amra, G. Albrand, and P. Roche, “Theory and application of antiscattering single layers: antiscattering antireflection coatings,” Appl. Opt. 25, 2695–2702 (1986). [CrossRef]
  5. I. J. Hodgkinson, P. I. Bowmar, and Q. H. Wu, “Scatter from tilted-columnar birefringent thin films: observation and measurement of anisotropic scatter distributions,” Appl. Opt 34, 163–168 (1995). [CrossRef]
  6. I. J. Hodgkinson, S. C. Cloughley, Q. H. Wu, and S. Kassam, “Anisotropic scatter patterns and anomalous birefringence of obliquely deposited cerium oxide films,” Appl. Opt. 35, 5563–5568 (1996). [CrossRef]
  7. S. Kassam, I. J. Hodgkinson, Q. H. Wu, and S. C. Cloughley, “Light scattering from thin films with an oblique columnar structure and with granular inclusions,” J. Opt. Soc. Am. A 12, 2009–2021 (1995). [CrossRef]
  8. P. Bousquet, F. Flory, and P. Roche, “Scattering from multilayer thin films: theory and experiment,” J. Opt. Soc. Am. 71, 1115–1123 (1981). [CrossRef]
  9. J. M. Elson, J. P. Rahn, and J. M. Bennett, “Light scattering from multilayer optics: comparison of theory and experiment,” Appl. Opt. 19, 669–679 (1980). [CrossRef]
  10. C. Amra, “Light scattering from multilayer optics. I. Tools of investigation,” J. Opt. Soc. Am. A 11, 197–210 (1994). [CrossRef]
  11. A. Duparré, J. Ferre-Borrull, S. Gliech, G. Notni, J. Steinert, and J. M. Bennett, “Surface characterization techniques for determining the root-mean-square roughness and power spectral densities of optical components,” Appl. Opt. 41, 154–171 (2002). [CrossRef]
  12. E. L. Church, H. A. Jenkinson, and J. M. Zavada, “Relationship between surface scattering and microtopographic features,” Opt. Eng. 18, 125–136 (1979). [CrossRef]
  13. J. C. Stover, Optical Scattering: Measurement and Analysis, 3rd ed. (SPIE, 2012).
  14. E. L. Church and P. Z. Takacs, “The optimal estimation of finish parameters,” Proc. SPIE 1530, 71–85 (1991). [CrossRef]
  15. International Organization for Standardization, “Optics and optical instruments: test methods for radiation scattered by optical components,” ISO 13696:2002 (2002).
  16. M. Trost, S. Schröder, C. C. Lin, A. Duparré, and A. Tünnermann, “Roughness characterization of EUV multilayer coatings and ultra-smooth surfaces by light scattering,” Proc. SPIE 8501, 85010F (2012). [CrossRef]
  17. S. Schröder, H. Uhlig, A. Duparré, and N. Kaiser, “Nanostructure and optical properties of fluoride films for high-quality DUV/VUV optical components,” Proc. SPIE 5963, 59630R (2005). [CrossRef]
  18. J. V. Grishchenko and M. L. Zanaveskin, “Investigation into the correlation factor of substrate and multilayer film surfaces by atomic force microscopy,” Crystallogr. Rep. 58, 493–497 (2013). [CrossRef]
  19. D. Rönnow, “Determination of interface roughness cross correlation of thin films from spectroscopic light scattering measurements,” J. Appl. Phys. 81, 3627–3636 (1997). [CrossRef]
  20. C. Bräuer-Burchardt, S. Schröder, M. Trost, P. Kühmstedt, A. Duparré, and G. Notni, “Roughness determination of ultra thin multilayer coatings in cross-section images with poor SNR using edge localization,” Proceedings of the 6th International Symposium on Image and Signal Processing and Analysis, 2009, pp. 176–181.
  21. J. M. Nieuwenhuizen and H. B. Haanstra, “Microfractography of thin films,” Philips Tech. Rev. 27, 87–91 (1966).
  22. H. A. Macleod, “Structure-related optical properties of thin films,” J. Vac. Sci. Technol. A 4, 418–422 (1986). [CrossRef]
  23. M. Trost, S. Schröder, T. Feigl, A. Duparré, and A. Tünnermann, “Roughness characterization of large EUV mirror optics by laser light scattering,” Proc. SPIE 8169, 81690P (2011). [CrossRef]
  24. S. Schröder, M. Trost, T. Feigl, J. E. Harvey, and A. Duparré, “Efficient specification and characterization of surface roughness for extreme ultraviolet optics,” Proc. SPIE 7969, 79692C (2011). [CrossRef]
  25. M. Trost, S. Schröder, A. Duparré, S. Risse, T. Feigl, U. D. Zeitner, and A. Tünnermann, “Structured Mo/Si multilayers for IR-suppression in laser-produced EUV light sources,” Opt. Express 21, 27852–27864 (2013). [CrossRef]
  26. T. Herffurth, S. Schröder, M. Trost, A. Duparré, and A. Tünnermann, “Comprehensive nanostructure and defect analysis using a simple 3D light-scatter sensor,” Appl. Opt. 52, 3279–3287 (2013). [CrossRef]
  27. J. Ferré-Borrull, A. Duparré, and E. Quesnel, “Roughness and light scattering of ion-beam-sputtered fluoride coatings for 193 nm,” Appl. Opt. 39, 5854–5864 (2000). [CrossRef]
  28. E. M. Gullikson and D. G. Stearns, “Asymmetric extreme ultraviolet scattering from sputter-deposited multilayers,” Phys. Rev. B 59, 13273–13277 (1999). [CrossRef]
  29. D. G. Stearns and E. M. Gullikson, “Nonspecular scattering from extreme ultraviolet multilayer coatings,” Physica B 283, 84–91 (2000). [CrossRef]
  30. S. Schröder, T. Herffurth, M. Trost, and A. Duparré, “Angle-resolved scattering and reflectance of extreme-ultraviolet multilayer coatings: measurement and analysis,” Appl. Opt. 49, 1503–1512 (2010). [CrossRef]
  31. D. G. Stearns, D. P. Gaines, D. W. Sweeney, and E. M. Gullikson, “Nonspecular x-ray scattering in a multilayer-coated imaging system,” J. Appl. Phys. 84, 1003–1028 (1998). [CrossRef]
  32. J. A. Thornton, “The microstructure of sputter-deposited coatings,” J. Vac. Sci. Technol. A 4, 3059–3065 (1986). [CrossRef]

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