Scattering from multilayer coatings depends on the roughness of each interface as well as their cross-correlation properties. By depositing thin film coatings under oblique incidence, the cross-correlation properties can be specifically adapted and consequently also the scattering characteristics. This will be illustrated for Mo/Si multilayers, for which a scattering reduction of more than 30% can be achieved. The characterization techniques used comprise of cross-sectional transmission electron microscopy, atomic force microscopy, and angle-resolved light scattering measurements at a wavelength of 13.5 nm.
© 2013 Optical Society of America
Original Manuscript: August 30, 2013
Revised Manuscript: November 11, 2013
Manuscript Accepted: November 11, 2013
Published: December 19, 2013
Marcus Trost, Tobias Herffurth, Sven Schröder, Angela Duparré, and Andreas Tünnermann, "Scattering reduction through oblique multilayer deposition," Appl. Opt. 53, A197-A204 (2014)