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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 53, Iss. 4 — Feb. 1, 2014
  • pp: A197–A204

Scattering reduction through oblique multilayer deposition

Marcus Trost, Tobias Herffurth, Sven Schröder, Angela Duparré, and Andreas Tünnermann  »View Author Affiliations


Applied Optics, Vol. 53, Issue 4, pp. A197-A204 (2014)
http://dx.doi.org/10.1364/AO.53.00A197


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Abstract

Scattering from multilayer coatings depends on the roughness of each interface as well as their cross-correlation properties. By depositing thin film coatings under oblique incidence, the cross-correlation properties can be specifically adapted and consequently also the scattering characteristics. This will be illustrated for Mo/Si multilayers, for which a scattering reduction of more than 30% can be achieved. The characterization techniques used comprise of cross-sectional transmission electron microscopy, atomic force microscopy, and angle-resolved light scattering measurements at a wavelength of 13.5 nm.

© 2013 Optical Society of America

OCIS Codes
(290.0290) Scattering : Scattering
(310.6860) Thin films : Thin films, optical properties
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)

History
Original Manuscript: August 30, 2013
Revised Manuscript: November 11, 2013
Manuscript Accepted: November 11, 2013
Published: December 19, 2013

Citation
Marcus Trost, Tobias Herffurth, Sven Schröder, Angela Duparré, and Andreas Tünnermann, "Scattering reduction through oblique multilayer deposition," Appl. Opt. 53, A197-A204 (2014)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-53-4-A197


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