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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 53, Iss. 4 — Feb. 1, 2014
  • pp: A291–A296

High laser-resistant multilayer mirrors by nodular defect planarization [Invited]

Christopher J. Stolz, Justin E. Wolfe, John J. Adams, Marlon G. Menor, Nick E. Teslich, Paul B. Mirkarimi, James A. Folta, Regina Soufli, Carmen S. Menoni, and Dinesh Patel  »View Author Affiliations


Applied Optics, Vol. 53, Issue 4, pp. A291-A296 (2014)
http://dx.doi.org/10.1364/AO.53.00A291


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Abstract

Substrate defect planarization has been shown to increase the laser resistance of 1053 nm mirror coatings to greater than 100J/cm2, an increase of 20-fold, when tested with 10 ns laser pulses. Substrate surface particles that are overcoated with optical interference mirror coatings become nodular defects, which behave as microlenses intensifying light into the defect structure. By a discrete process of angle-dependent ion etching and unidirectional ion-beam deposition, substrate defects can be reduced in cross-sectional area by over 90%.

© 2014 Optical Society of America

OCIS Codes
(140.3330) Lasers and laser optics : Laser damage
(230.4040) Optical devices : Mirrors
(240.0310) Optics at surfaces : Thin films
(310.1860) Thin films : Deposition and fabrication

History
Original Manuscript: August 29, 2013
Manuscript Accepted: September 16, 2013
Published: January 15, 2014

Citation
Christopher J. Stolz, Justin E. Wolfe, John J. Adams, Marlon G. Menor, Nick E. Teslich, Paul B. Mirkarimi, James A. Folta, Regina Soufli, Carmen S. Menoni, and Dinesh Patel, "High laser-resistant multilayer mirrors by nodular defect planarization [Invited]," Appl. Opt. 53, A291-A296 (2014)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-53-4-A291

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