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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 53, Iss. 4 — Feb. 1, 2014
  • pp: A314–A320

Behavior of optical thin-film materials and coatings under proton and gamma irradiation

Ilaria Di Sarcina, Maria Luisa Grilli, Francesca Menchini, Angela Piegari, Salvatore Scaglione, Anna Sytchkova, and Danilo Zola  »View Author Affiliations

Applied Optics, Vol. 53, Issue 4, pp. A314-A320 (2014)

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Optical materials and coatings are exposed to the flux of energetic particles when used in either space applications or nuclear energy plants. The study of their behavior in such an environment is important to avoid failure of the optical components during their operation. The optical performance of several thin-film materials (HfO2, Ta2O5, Nb2O5, TiO2, SiO2) and coatings, under irradiation with high-dose gamma rays (5.8 MGy) and exposure to low-energy (60 keV) protons, has been investigated. Some variations of optical properties have been detected in silicon oxide after irradiation, while the other materials are stable in such conditions.

© 2014 Optical Society of America

OCIS Codes
(310.1620) Thin films : Interference coatings
(310.6860) Thin films : Thin films, optical properties
(310.6870) Thin films : Thin films, other properties

Original Manuscript: September 4, 2013
Manuscript Accepted: November 15, 2013
Published: January 15, 2014

Ilaria Di Sarcina, Maria Luisa Grilli, Francesca Menchini, Angela Piegari, Salvatore Scaglione, Anna Sytchkova, and Danilo Zola, "Behavior of optical thin-film materials and coatings under proton and gamma irradiation," Appl. Opt. 53, A314-A320 (2014)

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