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Applied Optics

Applied Optics


  • Vol. 10, Iss. 2 — Feb. 1, 1971
  • pp: 295–299

Technical Feasibility of Figuring Optical Surfaces by Ion Polishing

J. B. Schroeder, H. D. Dieselman, and J. W. Douglass  »View Author Affiliations

Applied Optics, Vol. 10, Issue 2, pp. 295-299 (1971)

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Procedures are described to figure optical surfaces by ion polishing. Fused silica, ULE, and Cer-Vit were employed as substrate materials. The sputtering yields for these materials were: 1.9 (150-keV40 Ar+), 1.86 (150-keV 40Ar+), and 3.7 (80-keV 126Xe+) atoms/ion, respectively. The optical scatter, at λ = 632.8 nm, was measured to be 0.06%, which is comparable to good surfaces prepared by conventional lap techniques. The rms surface error was reduced from 0.05λ to 0.01λ over the central 0.12-m aperture of a 0.2-m diam fused silica flat by ion polishing with 150-keV 40Ar+. Based on this experience, the design of a manufacturing facility is discussed.

© 1971 Optical Society of America

Original Manuscript: April 20, 1970
Published: February 1, 1971

J. B. Schroeder, H. D. Dieselman, and J. W. Douglass, "Technical Feasibility of Figuring Optical Surfaces by Ion Polishing," Appl. Opt. 10, 295-299 (1971)

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  1. A. B. Meinel, S. Bashkin, D. A. Loomis, Appl. Opt. 4, 1674 (1965). [CrossRef]
  2. J. B. Schroeder, S. Bashkin, J. F. Nester, Appl. Opt. 5, 1031 (1966). [CrossRef] [PubMed]
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