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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 11, Iss. 6 — Jun. 1, 1972
  • pp: 1429–1429

Hologram Photoresist Noise

J. P. Kirk  »View Author Affiliations


Applied Optics, Vol. 11, Issue 6, pp. 1429-1429 (1972)
http://dx.doi.org/10.1364/AO.11.001429


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No abstract available.

History
Original Manuscript: February 14, 1972
Published: June 1, 1972

Citation
J. P. Kirk, "Hologram Photoresist Noise," Appl. Opt. 11, 1429-1429 (1972)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-11-6-1429


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References

  1. J. Nakajima, T. Inagaki, Y. Nishimura, Fujit. Sci. Tech. J.69 (Sept.1970).
  2. N. K. Sheridon, Appl. Phys. Lett. 12, 316 (1968). [CrossRef]
  3. M. T. Gale, D. L. Greenaway, J. P. Russell, “Applications of Holography,” in Proceedings of the International Symposium of Holography, Besancon, 6–11 July1970, Laboratorie de Physique Generale et Optique (Universite de Besancon, LaBouloie 25, Besancon, France), p. 1–11.
  4. R. Bartolini, W. Hannan, D. Karlsons, M. Lurie, Appl. Opt. 9, 2283 (1970). [CrossRef] [PubMed]
  5. M. J. Bessley, J. G. Castledine, Appl. Opt. 9, 2720 (1970). [CrossRef]
  6. R. K. Agnihotri, F. P. Hood, L. G. Lesoine, J. A. Offenbach, Photogr. Sci. Eng. 15, 141 (1971).
  7. The polyvinyl cinnamate photoresist used here is the commercially available Kodak Ortho Resist (Eastman Kodak Co.).
  8. H. D. Keith, F. J. Padden, R. G. Vadimsky, J. Appl. Phys. 42, 4584 (1971). [CrossRef]

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