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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 11, Iss. 7 — Jul. 1, 1972
  • pp: 1563–1567

Photobleaching of Organic Laser Dyes in Solid Matrices

I. P. Kaminow, L. W. Stulz, E. A. Chandross, and C. A. Pryde  »View Author Affiliations


Applied Optics, Vol. 11, Issue 7, pp. 1563-1567 (1972)
http://dx.doi.org/10.1364/AO.11.001563


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Abstract

A technique is described for measuring the rate of photobleaching of anisotropic dye molecules in solid polymer matrices. Three dyes of different classes in two matrices (PMMA and epoxy resin) show bleaching rates that differ by a factor of 20. The bleaching rate is linearly proportional to the intensity of incident radiation, indicating a one-photon process; bleaching is probably due to a chemical reaction of the dye in its first excited singlet or lowest triplet state.

© 1972 Optical Society of America

History
Original Manuscript: December 1, 1971
Published: July 1, 1972

Citation
I. P. Kaminow, L. W. Stulz, E. A. Chandross, and C. A. Pryde, "Photobleaching of Organic Laser Dyes in Solid Matrices," Appl. Opt. 11, 1563-1567 (1972)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-11-7-1563


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References

  1. J. Kosar, Light-Sensitive Systems (Wiley, New York, 1965).
  2. E. P. Ippen, C. V. Shank, A. Dienes, IEEE J. Quantum Electron. QE7, 178 (1971).
  3. I. P. Kaminow, H. P. Weber, E. A. Chandross, Appl. Phys. Lett. 18, 497 (1971).
  4. H. Meier, “Photochemistry of Dyes,” in The Chemistry of Synthetic Dyes, K. Venkataraman, Ed. (Academic Press, New York, 1971), Vol. 4.
  5. J. G. Calvert, J. N. Pitts, Photochemistry (Wiley, New York, 1966), p. 592.
  6. G. C. Pimentel, in Formation and Trapping of Free Radicals, A. M. Bass, H. P. Broida, Eds. (Academic Press, New York, 1960), Chap. 4.
  7. R. L. Fork, Z. Kaplan, BTL; to be published.
  8. W. J. Tomlinson, Appl. Opt. 11, 823 (1972).
  9. H. W. Grimmel, in Organic Chemistry, H. Gilman, Ed. (Wiley, New York, 1953), Vol. 3, Chap. 5, p. 322.
  10. W. J. Tomlinson, I. P. Kaminow, E. A. Chandross, R. L. Fork, W. T. Silfvast, Appl. Phys. Lett. 16, 486 (1970).
  11. B. B. Snavely, Proc. IEEE 57, 1374 (1969).

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