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Applied Optics

Applied Optics


  • Vol. 12, Iss. 3 — Mar. 1, 1973
  • pp: 455–459

Ion Beam Micromachining of Integrated Optics Components

Hugh L. Garvin, E. Garmire, S. Somekh, H. Stoll, and A. Yariv  »View Author Affiliations

Applied Optics, Vol. 12, Issue 3, pp. 455-459 (1973)

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Thin film integrated optics components such as light guides, modulators, directional couplers, and polarizers demand high quality edge smoothness and high resolution pattern formation in dimensions down to submicrometer size. Fabrication techniques combining holographic and scanning electron beam lithography with ion beam micromachining have produced planar phase gratings with intervals as small as 2800 Å, guiding channel couplers in GaAs, and also wire- grid polarizers for 10.6-μm radiation.

© 1973 Optical Society of America

Original Manuscript: September 7, 1972
Published: March 1, 1973

Hugh L. Garvin, E. Garmire, S. Somekh, H. Stoll, and A. Yariv, "Ion Beam Micromachining of Integrated Optics Components," Appl. Opt. 12, 455-459 (1973)

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  1. A. Yariv, “Active Integrated Optics,” in Proceedings, 1971 Esfahan Conference on Pure and Applied Laser Physics (Wiley, New York), to be published.
  2. Many applications have been cited at the Symposia on the Deposition of Thin Films by Sputtering, sponsored by the University of Rochester and Bendix Corporation, Rochester, New York, held in 1966, 1967, and 1969, and at the Conference and School Sessions on the elements, techniques, and applications of sputtering sponsored by the Materials Research Corp., Orangeburg, New York.
  3. J. E. Groell, R. D. Standley, Bell Syst. Tech. J. 48, 3445 (1969).
  4. H. L. Garvin, in Proceedings, 3rd Symposium on the Deposition of Thin Films by Sputtering (Bendix Corp., Rochester, N.Y.,1969), pp. 4–11.
  5. D. Marcuse, Bell Syst. Tech. J. 48, 3177 (1969).
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  8. S. Somekh, A. Yariv, Appl. Phys. Lett. 21, 140 (1972). [CrossRef]
  9. R. G. Brandes, R. K. Curran, Appl. Opt. 10, 2101 (1971). [CrossRef] [PubMed]
  10. E. D. Wolf, F. S. Ozdemir, W. E. Perkins, P. J. Coane, “Response of Elvacite 2041,” in Proc. 11th Symposium on Electron, Ion and Laser Beam Technology, R. F. M. Thorley, Ed. (San Francisco Press, San Francisco, 1970), pp. 331–336.
  11. E. A. J. Marcatili, Bell Syst. Tech. J. 48, 2071 (1969).
  12. R. Shubert, J. H. Harris, J. Opt. Soc. Am. 61, 154 (1971). Also R. Ulrich, R. J. Martin, Appl. Opt. 10, 2077 (1971). [CrossRef] [PubMed]
  13. E. Garmire, H. Stoll, A. Yariv, R. G. Hunsperger, Appl. Phys. Lett. 21, 87 (1972). [CrossRef]
  14. R. D. Standley, W. M. Gibson, J. W. Rodgers, Appl. Opt. 11, 1313 (1972). [CrossRef] [PubMed]
  15. H. F. Taylor, W. E. Martin, D. B. Hall, V. N. Smiley, Appl. Phys. Lett. 21, 95 (1972). [CrossRef]
  16. S. Somekh, E. Garmire, A. Yariv, H. L. Garvin, R. G. Hunsperger, Appl. Phys. Lett. 22, 46 (1973). [CrossRef]
  17. J. P. Auton, Appl. Opt. 6, 1023 (1967). [CrossRef] [PubMed]

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