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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 12, Iss. 4 — Apr. 1, 1973
  • pp: 729–736

Electron-Resist Fabrication of Bends and Couplers for Integrated Optical Circuits

J. E. Goell  »View Author Affiliations


Applied Optics, Vol. 12, Issue 4, pp. 729-736 (1973)
http://dx.doi.org/10.1364/AO.12.000729


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Abstract

The fabrication of complex integrated optical circuits using thin films will require dielectric patterns of high resolution and edge smoothness. This paper describes an electron-beam technique that has been used to form a curved thin-film light guide and a directional coupler, and is applicable to filters and other more complex components.

© 1973 Optical Society of America

History
Original Manuscript: September 27, 1972
Published: April 1, 1973

Citation
J. E. Goell, "Electron-Resist Fabrication of Bends and Couplers for Integrated Optical Circuits," Appl. Opt. 12, 729-736 (1973)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-12-4-729


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References

  1. S. E. Miller, Bell Syst. Tech. J. 48, 2059 (1969).
  2. D. Marcuse, Bell Syst. Tech. J. 48, 3187 (1969).
  3. J. E. Goell, R. D. Standley, Bell Syst. Tech. J. 48, 3445 (1969).
  4. I. Haller, M. Hatzakis, R. Srinivasan, IBM J. Res. Dev. 12, 251 (1968). [CrossRef]
  5. J. E. Goell, “Election-Resist Fabrication of Integrated Optical Circuits,” in Digest of OSA Topical Meeting in Integrated Optics-Guided Waves, Materials, Devices, Las Vegas, 7–10 February 1972 (Optical Society of America, Washington D.C., 1972), pp MB8-1 to MB8-4.
  6. T. Li, “Passive Integrated Optical Circuits,” in Digest of the Topical Meeting on Integrated Optics-Guide Waves, Materials, Devices, Las Vegas, 7–10 February, 1972 (Optical Society of America, Washington, D.C., 1972).
  7. J. E. Goell, Bell Syst. Tech. J. 48, 2133 (1969).
  8. E. A. J. Marcatili, Bell Syst. Tech. J. 48, 2071 (1969).
  9. E. A. J. Marcatili, Bell Syst. Tech. J. 48, 2103 (1969).
  10. J. L. Vossen, J. Vac. Sci. Tech. 8, 512 (1971). [CrossRef]
  11. W. M. Muska, to be published.
  12. Barium Silicate Films for Integrated Optical Circuits, MM 72-1363-8.
  13. K. Amboss, E. D. Wolf, “Double-Deflection Aberrations in a Scanning Election Microscope,” in Symposium on Electron, Ion, and Laser Beam Tech., Boulder, Colo., 1971.
  14. P. K. Tien, R. Ulrich, R. J. Martin, Appl. Phys. Lett. 14, 291 (1969). [CrossRef]

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