Electron-Resist Fabrication of Bends and Couplers for Integrated Optical Circuits
Applied Optics, Vol. 12, Issue 4, pp. 729-736 (1973)
http://dx.doi.org/10.1364/AO.12.000729
Acrobat PDF (1553 KB)
Abstract
The fabrication of complex integrated optical circuits using thin films will require dielectric patterns of high resolution and edge smoothness. This paper describes an electron-beam technique that has been used to form a curved thin-film light guide and a directional coupler, and is applicable to filters and other more complex components.
Citation
J. E. Goell, "Electron-Resist Fabrication of Bends and Couplers for Integrated Optical Circuits," Appl. Opt. 12, 729-736 (1973)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-12-4-729
You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
« Previous Article | Next Article »
OSA is a member of 