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Applied Optics

Applied Optics


  • Vol. 12, Iss. 4 — Apr. 1, 1973
  • pp: 758–763

Investigation of Film Thickness Uniformity on Substrates Located Close to the Source Axis

Jean M. Bennett and E. J. Ashley  »View Author Affiliations

Applied Optics, Vol. 12, Issue 4, pp. 758-763 (1973)

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The thickness uniformity that can be obtained near the source axis in evaporation systems having long source-to-substrate distances (~50 cm) and small area sources has been investigated using multiple beam interferometry. Silver films were evaporated from resistance-heated dimple boats in standard vacuum and ultrahigh vacuum onto stationary and rotating substrates 3.86 cm in diameter symmetrically placed about the source axis. Thickness variations in the films were measured across substrate diameters, and the average film thicknesses were compared. Similar data were also obtained for aluminum, aluminum oxide, and germanium films. Random thickness variations have been found on all the films, which are much larger than the uniform thickness gradations predicted by the geometric theory. These variations can be minimized but not eliminated by planetary rotation of the substrates.

© 1973 Optical Society of America

Original Manuscript: July 3, 1972
Published: April 1, 1973

Jean M. Bennett and E. J. Ashley, "Investigation of Film Thickness Uniformity on Substrates Located Close to the Source Axis," Appl. Opt. 12, 758-763 (1973)

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