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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 13, Iss. 1 — Jan. 1, 1974
  • pp: 129–139

Characteristics of Relief Phase Holograms Recorded in Photoresists

R. A. Bartolini  »View Author Affiliations


Applied Optics, Vol. 13, Issue 1, pp. 129-139 (1974)
http://dx.doi.org/10.1364/AO.13.000129


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Abstract

Recording of relief phase holograms in Shipley AZ-1350 positive photoresist is investigated in this report. It is found that the use of Shipley AZ-303 developer with Shipley AZ-1350 photoresist relieves the material nonlinearity usually associated with photoresists, thereby allowing higher image readout efficiencies. The use of Shipley AZ-303 developer also provides an increase in material sensitivity. A theoretical model for positive photoresist exposure characteristics is developed and verified by empirical results. Using Shipley AZ-303 developer, a design procedure for recording useful (i.e., acceptable SNR > 25 dB, high efficiency ~3–5%, exposure sensitivity ~ a few mJ·cm−2) relief phase holograms in Shipley AZ-1350 positive photoresist is synthesized.

© 1974 Optical Society of America

History
Original Manuscript: May 15, 1973
Published: January 1, 1974

Citation
R. A. Bartolini, "Characteristics of Relief Phase Holograms Recorded in Photoresists," Appl. Opt. 13, 129-139 (1974)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-13-1-129


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