Abstract

A computer-controlled electron beam has been used to fabricate complex thin film waveguide structures in an electron resist (polyphenylsiloxane). The machine uses an interferometric substrate positioning technique to enable covering macroscopic distances. Elements fabricated include straight and curved guides, triangular transition elements, directional couplers, and resonant ring structures between straight guides. Typical guide widths are 5 or 10 μ with lengths ranging up to several centimeters. Losses (2 to 5 dB/cm at 6328 Å) are primarily due to scattering by localized proturberances, which should be possible to eliminate.

© 1974 Optical Society of America

Gratings for Integrated Optics by Electron Lithography

J. C. Tracy, L. F. Thompson, R. D. Heidenreich, and J. L. Merz
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Efficient encoding algorithms for computer-aided design of diffractive optical elements by the use of electron-beam fabrication

Jiao Fan, David Zaleta, Kristopher S. Urquhart, and Sing H. Lee
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Distribution Networks and Electrically Controllable Couplers for Integrated Optics

C. Elachi and C. Yeh
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Electron-Resist Fabrication of Bends and Couplers for Integrated Optical Circuits

J. E. Goell
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Single-Crystal Electrooptic Thin-Film Waveguide Modulators for Infrared Laser Systems

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