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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 15, Iss. 12 — Dec. 1, 1976
  • pp: 2992–2997

Electron microscopic investigations of cross sections of optical thin films

K. H. Guenther and H. K. Pulker  »View Author Affiliations


Applied Optics, Vol. 15, Issue 12, pp. 2992-2997 (1976)
http://dx.doi.org/10.1364/AO.15.002992


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Abstract

In this paper results are given of an electron optical investigation of the cross section of optical single films and multilayers obtained by fracture. Direct observation techniques with scanning microscopy and the surface replica technique with transmission microscopy were used. Scanning microscopy is simple in sample preparation but has relatively low resolution. The highest resolution of microstructural details can be obtained only with the replica technique in the transmission microscope. Photographs of ZnS-, MgF2-, ThF4-, TiO2-, and SiO2-films mainly in the form of multilayers and of a cermet-type sun protection film are shown. Some optical film properties, such as refractive index and light scattering, are strongly influenced by film microstructure.

© 1976 Optical Society of America

History
Original Manuscript: September 10, 1976
Published: December 1, 1976

Citation
K. H. Guenther and H. K. Pulker, "Electron microscopic investigations of cross sections of optical thin films," Appl. Opt. 15, 2992-2997 (1976)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-15-12-2992

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