A novel technique for the fabrication of binary-phase computer-generated reflection holograms is described. By use of integrated circuit technology, the holographic pattern is etched into a silicon wafer and then aluminum coated to make a reflection hologram. Because these holograms reflect virtually all the incident radiation, they may find application in machining with high-power lasers. A number of possible modifications of the hologram fabrication procedure are discussed.
© 1977 Optical Society of America
Original Manuscript: June 18, 1976
Published: February 1, 1977
Neal C. Gallagher, John C. Angus, Frederick E. Coffield, Robert V. Edwards, and J. Adin Mann, "Binary phase digital reflection holograms: fabrication and potential applications," Appl. Opt. 16, 413-417 (1977)