Plasma polymerized vinyltrimethoxy silane films were deposited on transparent polycarbonate substrates. The adherent, clear films protected the substrates from abrasion and also served as antireflection coatings. Posttreatment of the vinyltrimethoxy silane films in an oxygen glow discharge further improved the abrasion resistance. ESCA (electron spectroscopy for chemical analysis) and ir transmission spectra of some films were recorded, and an elemental analysis of the films was obtained.
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A separate analysis for oxygen in the presence of silicon cannot be made by the dry combustion method. Therefore, the oxygen concentration in the polymer film can only be estimated by difference.
Calculated from wt % SiO2.
Table II
Results from ESCA Analysis of Untreated and Oxygen Posttreated Plasma Polymerized Vinyltrimethoxy Silane Films Deposited on Polycarbonate Substrates
Theoretical atom percents in the monomer: C = 23.81; O = 14.28; Si = 4.76; and H = 57.14.
Atom ratios in the monomer: O/C = 0.6; O/Si = 3.0; Si/C = 0.2.
From analysis of the bulk polymer.
Table III
Assignment of Infrared Absorption Bands for an Untreated Plasma Polymerized Vinyltrimethoxy Silane Film
A separate analysis for oxygen in the presence of silicon cannot be made by the dry combustion method. Therefore, the oxygen concentration in the polymer film can only be estimated by difference.
Calculated from wt % SiO2.
Table II
Results from ESCA Analysis of Untreated and Oxygen Posttreated Plasma Polymerized Vinyltrimethoxy Silane Films Deposited on Polycarbonate Substrates
Theoretical atom percents in the monomer: C = 23.81; O = 14.28; Si = 4.76; and H = 57.14.
Atom ratios in the monomer: O/C = 0.6; O/Si = 3.0; Si/C = 0.2.
From analysis of the bulk polymer.
Table III
Assignment of Infrared Absorption Bands for an Untreated Plasma Polymerized Vinyltrimethoxy Silane Film