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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 17, Iss. 16 — Aug. 15, 1978
  • pp: 2556–2561

Effects of ion etching on the properties of GaAs

M. Kawabe, N. Kanzaki, K. Masuda, and S. Namba  »View Author Affiliations


Applied Optics, Vol. 17, Issue 16, pp. 2556-2561 (1978)
http://dx.doi.org/10.1364/AO.17.002556


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Abstract

Effects of ion etching on the optical properties and lattice disorder of GaAs were studied by means of photoluminescence, He backscattering, and enhanced chemical etching. The photoluminescence intensity excited by a He–Cd laser (3250 Å), which penetrates a distance of approximately 150 Å into GaAs, is decreased to less than 20% of the initial value after ion etching by 100-eV Ar and recovered almost completely by 450° C annealing. Helium backscattering and electron diffraction pattern indicate the existence of an amorphous layer, the thickness of which is 20% larger than the value estimated by LSS theory. Photoluminescence measurement shows that beyond this amorphous region there are distributed a lot of nonradiative recombination centers as well as radiative recombination centers which diffuse into the bulk. The depth of this distribution is larger than that of the amorphous region by 1 order of magnitude.

© 1978 Optical Society of America

History
Original Manuscript: September 21, 1977
Published: August 15, 1978

Citation
M. Kawabe, N. Kanzaki, K. Masuda, and S. Namba, "Effects of ion etching on the properties of GaAs," Appl. Opt. 17, 2556-2561 (1978)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-17-16-2556


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