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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 17, Iss. 16 — Aug. 15, 1978
  • pp: 2570–2574

Measurement technique of OH-ion distribution profile in rod preform of silica-based optical fiber waveguides

M. Horiguchi and M. Kawachi  »View Author Affiliations


Applied Optics, Vol. 17, Issue 16, pp. 2570-2574 (1978)
http://dx.doi.org/10.1364/AO.17.002570


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Abstract

To study the OH-ion contamination mechanism in silica-based optical fiber waveguides, a method for measuring the OH-ion distribution profile in fiber-rod preforms has been developed. Using a low-OH-content optical fiber as a light probe of the measuring set, high spatial resolution of several tens of micrometers was obtained. Using this technique, the OH-ion distribution profiles in nondoped silica-rod preforms were measured optically at 2.73 μm. The OH-ion distribution profile observed closely agreed with the calculated diffusion profile, from which the diffusion coefficient of OH-ion in silica glass was estimated to be ~7.0 × 10−9 cm2 sec−1 at 1600°C.

© 1978 Optical Society of America

History
Original Manuscript: November 14, 1977
Published: August 15, 1978

Citation
M. Horiguchi and M. Kawachi, "Measurement technique of OH-ion distribution profile in rod preform of silica-based optical fiber waveguides," Appl. Opt. 17, 2570-2574 (1978)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-17-16-2570

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