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Applied Optics

Applied Optics


  • Vol. 17, Iss. 16 — Aug. 15, 1978
  • pp: 2570–2574

Measurement technique of OH-ion distribution profile in rod preform of silica-based optical fiber waveguides

M. Horiguchi and M. Kawachi  »View Author Affiliations

Applied Optics, Vol. 17, Issue 16, pp. 2570-2574 (1978)

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To study the OH-ion contamination mechanism in silica-based optical fiber waveguides, a method for measuring the OH-ion distribution profile in fiber-rod preforms has been developed. Using a low-OH-content optical fiber as a light probe of the measuring set, high spatial resolution of several tens of micrometers was obtained. Using this technique, the OH-ion distribution profiles in nondoped silica-rod preforms were measured optically at 2.73 μm. The OH-ion distribution profile observed closely agreed with the calculated diffusion profile, from which the diffusion coefficient of OH-ion in silica glass was estimated to be ~7.0 × 10−9 cm2 sec−1 at 1600°C.

© 1978 Optical Society of America

Original Manuscript: November 14, 1977
Published: August 15, 1978

M. Horiguchi and M. Kawachi, "Measurement technique of OH-ion distribution profile in rod preform of silica-based optical fiber waveguides," Appl. Opt. 17, 2570-2574 (1978)

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  1. M. Horiguchi, H. Osanai, Electron. Lett. 12, 310 (1976). [CrossRef]
  2. H. Osanai, T. Shioda, T. Moriyama, S. Araki, M. Horiguchi, T. Izawa, H. Takata, Electron. Lett. 12, 549 (1976). [CrossRef]
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  8. T. Bell, G. Hetherington, K. H. Jack, Phys. Chem. Glasses 3, 141 (1962).

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