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Applied Optics

Applied Optics


  • Vol. 17, Iss. 21 — Nov. 1, 1978
  • pp: 3477–3481

Surface damage and the optical reflectance of single-crystal silicon

P. J. Zanzucchi and M. T. Duffy  »View Author Affiliations

Applied Optics, Vol. 17, Issue 21, pp. 3477-3481 (1978)

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The reflectance of silicon measured at 4.3 eV can be used to determine the surface quality of silicon. Crystallographic damage, which occurs with abrasive polishing, and texture, which occurs with epitaxial film growth, can be detected. The effect of surface damage on the optical reflectance of silicon measured at 4.3 eV is reported. The reflectance measurement is nondestructive, simple, fast (on the order of seconds), and sensitive. The technique is readily adaptable to quality control inspection in silicon device manufacturing facilities.

© 1978 Optical Society of America

Original Manuscript: April 8, 1978
Published: November 1, 1978

P. J. Zanzucchi and M. T. Duffy, "Surface damage and the optical reflectance of single-crystal silicon," Appl. Opt. 17, 3477-3481 (1978)

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  1. T. M. Buck, R. L. Meek, in Silicon Device Processing, C. P. Marsden, Ed., NBS Special Publication 337 (NBS, Washington DC, 1970), p. 419.
  2. R. Stickler, S. R. Booker, Philos. Mag. 8, 859 (1963). [CrossRef]
  3. S. H. McFarlane, C. C. Wang, J. Appl. Phys. 43, 1724 (1972). [CrossRef]
  4. S. Mendelson, J. Appl. Phys. 35, 1570 (1964). [CrossRef]
  5. Ch. Kühl, H. Schlötterer, F. Schwidefsky, J. Electrochem. Soc. 121, 1496 (1974). [CrossRef]
  6. T. M. Donovan, E. J. Ashley, H. E. Bennett, J. Opt. Soc. Am. 53, 1403 (1963). [CrossRef]
  7. H. E. Bennett, J. O. Porteus, J. Opt. Soc. Am. 51, 123 (1961). [CrossRef]
  8. G. W. Cullen, J. Cryst. Growth 9, 107 (1971). [CrossRef]
  9. H. M. Manasevit, J. Cryst. Growth 22, 125 (1974). [CrossRef]
  10. L. J. Cunningham, A. J. Braundmeier, Phys. Rev. B 14, 479 (1976). [CrossRef]
  11. J. G. Endriz, W. E. Spicer, Phys. Rev. B 4, 4144 (1971). [CrossRef]
  12. National Bureau of Standards, Standard Reference Materials 2003, Aluminum on Glass, A Standard for Specular Spectra Reflectance.
  13. A. M. Goodman, RCA Laboratories, unpublished work.
  14. J. Burmeister, J. Cryst. Growth 11, 313 (1971). [CrossRef]
  15. P. J. Zanzucchi, M. T. Duffy, R. C. Alig, J. Electrochem Soc. 125, 299 (1978). [CrossRef]

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