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Applied Optics

Applied Optics


  • Vol. 17, Iss. 21 — Nov. 1, 1978
  • pp: 3491–3495

Versatile high-temperature high-pressure vapor cell design for electron beam excited laser studies

G. Marowsky, R. Cordray, F. K. Tittel, and W. L. Wilson  »View Author Affiliations

Applied Optics, Vol. 17, Issue 21, pp. 3491-3495 (1978)

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The design of a cell suitable for studying electron beam excited laser candidates at high temperatures such as organic dye and metal vapors is described. The cell is capable of handling temperatures up to 450°C and pressures from 10−6 Torr to 15 atm. Details of both the high-temperature laser performance of Ar-N2 and the gain characteristics of the dye POPOP [2,2′ phenylenebis(5-phenyloxazole)] are presented as an example of the use of such a cell.

© 1978 Optical Society of America

Original Manuscript: February 18, 1978
Published: November 1, 1978

G. Marowsky, R. Cordray, F. K. Tittel, and W. L. Wilson, "Versatile high-temperature high-pressure vapor cell design for electron beam excited laser studies," Appl. Opt. 17, 3491-3495 (1978)

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  1. S. A. Edelstein, Opt. Commun. 21, 27 (1977). [CrossRef]
  2. G. Marowsky, R. Cordray, F. Tittel, B. Wilson, J. W. Keto, J. Chem. Phys. 67, 4845 (1977). [CrossRef]
  3. C. T. Ryan, T. K. Gustafson, Chem. Phys. Lett. 44, 241 (1976). [CrossRef]
  4. J. Kofflend, R. W. Field, D. R. Guyer, S. R. Leone, Laser Spectroscopy III, J. Hall, J. L. Carlsten, Eds. (Springer, Berlin, 1977), p. 382.
  5. R. R. Jacobs, W. F. Krupke, Electronic Transition Lasers, L. E. Wilson, S. N. Surchard, J. F. Steinfield, Eds. (MIT Press, Cambridge, 1977), p. 246; also Appl. Phys. Lett. 32, 31 (1978).
  6. C. Rhodes, R. R. Jacobs, L. Schlie, 7th Winter Colloquium on High Power Visible Lasers, Park City, Utah, 16–18 February 1977.
  7. J. J. Ewing, C. A. Brau, in Tunable Lasers and Applications, A. Mooradian, Ed. (Springer, Berlin, 1976).
  8. C. V. Shank, Rev. Mod. Phys. 47, 649 (1975). [CrossRef]
  9. Developed in cooperation with M. Houben, Perkin-Elmer Corporation, Norwalk, Conn.
  10. 3M transparency film, ir sensitive, type 529.
  11. G. Marowsky, R. Cordray, F. K. Tittel, W. Wilson, C. B. Collins, submitted to IEEE J. Quantum Electron.QE-14, 434 (1978). [CrossRef]
  12. G. Marowsky, R. Cordray, F. K. Tittel, W. L. Wilson, accepted by Appl. Phys. Lett.32, 561 (1978). [CrossRef]
  13. M. L. Bhaumik, Inst. Phys. Conf. Ser. 29, 122 (1976).

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