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Applied Optics

Applied Optics


  • Vol. 17, Iss. 22 — Nov. 15, 1978
  • pp: 3636–3640

Fizeau interferometry for measuring refractive index and thickness of nearly transparent films

A. B. Buckman and C. Kuo  »View Author Affiliations

Applied Optics, Vol. 17, Issue 22, pp. 3636-3640 (1978)

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A simple method for measuring refractive index and thickness of nearly transparent films from Fizeau interferograms is described. The method requires no polarizing optics, variation of wavelength or angle of incidence, or precise light intensity comparisons. Commercially available Fizeau surface relief measuring instruments can be used without modification, the only necessary change being a partial, rather than complete, metallization of the sample surface. Analysis of the contributions of different sources of error to the over-all error in the refractive-index measurement indicates that the measurement is quite insensitive to weak absorption in the dielectric film and to finite absorption in the metal layer. For typical values of index and thickness, the thickness error is about 0.005 wavelengths, and the refractive-index error is of the order 0.01.

© 1978 Optical Society of America

Original Manuscript: March 16, 1978
Published: November 15, 1978

A. B. Buckman and C. Kuo, "Fizeau interferometry for measuring refractive index and thickness of nearly transparent films," Appl. Opt. 17, 3636-3640 (1978)

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  1. D. W. Peterson, N. M. Bashara, J. Opt. Soc. Am. 55, 845 (1965). [CrossRef]
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  8. The interferograms used in these experiments were produced by an Angstrometer purchased from Sloan Technology, Inc., and operated without modification.

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