Abstract

Many spectral filtering problems require assemblies of layers having thicknesses that bear no obvious relationship to one another. After a brief review of the optical methods used to monitor deposition of multilayers containing nonintegral thicknesses, we show that the performance of monitoring systems can be improved further by including the real-time calculation of any necessary layer thickness changes that may be required to compensate any errors that might still occur. The apparatus described consists of a minicomputer coupled to a rapid-scanning spectrometer. Such a procedure working in real time avoids the cumulative effects of successive errors. The technique is demonstrated in the production of a beam splitter.

© 1979 Optical Society of America

Optical monitoring of nonquarterwave multilayer filters

B. Vidal, A. Fornier, and E. Pelletier
Appl. Opt. 17(7) 1038-1047 (1978)

Wideband optical monitoring of nonquarterwave multilayer filters

B. Vidal, A. Fornier, and E. Pelletier
Appl. Opt. 18(22) 3851-3856 (1979)

Optical thin film production with continuous reoptimization of layer thicknesses

C. Holm
Appl. Opt. 18(12) 1978-1982 (1979)

Optical monitoring of nonquarterwave layers of dielectric multilayer filters using optical admittance

Byung Jin Chun, Chang Kwon Hwangbo, and Jong Sup Kim
Opt. Express 14(6) 2473-2480 (2006)

Optical monitoring of nonquarterwave film thicknesses using a turning point method

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