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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 19, Iss. 11 — Jun. 1, 1980
  • pp: 1853–1855

Electric field distribution and the reduction of laser damage in multilayers

O. Arnon and P. Baumeister  »View Author Affiliations


Applied Optics, Vol. 19, Issue 11, pp. 1853-1855 (1980)
http://dx.doi.org/10.1364/AO.19.001853


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Abstract

The characteristic matrix method is used to compute the electric field distribution in a multilayer. The use of optically inhomogeneous films is suggested to lessen discontinuity in the material properties and in the absorption distribution at interfaces between the high-index and the low-index layers, thereby enhancing the laser damage threshold.

© 1980 Optical Society of America

History
Original Manuscript: December 14, 1979
Published: June 1, 1980

Citation
O. Arnon and P. Baumeister, "Electric field distribution and the reduction of laser damage in multilayers," Appl. Opt. 19, 1853-1855 (1980)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-19-11-1853

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