The characteristic matrix method is used to compute the electric field distribution in a multilayer. The use of optically inhomogeneous films is suggested to lessen discontinuity in the material properties and in the absorption distribution at interfaces between the high-index and the low-index layers, thereby enhancing the laser damage threshold.
© 1980 Optical Society of America
Original Manuscript: December 14, 1979
Published: June 1, 1980
O. Arnon and P. Baumeister, "Electric field distribution and the reduction of laser damage in multilayers," Appl. Opt. 19, 1853-1855 (1980)