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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 19, Iss. 14 — Jul. 15, 1980
  • pp: 2329–2331

Chemical–mechanical polishing of low-scatter optical surfaces

R. B. Mcintosh, Jr. and R. A. Paquin  »View Author Affiliations


Applied Optics, Vol. 19, Issue 14, pp. 2329-2331 (1980)
http://dx.doi.org/10.1364/AO.19.002329


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Abstract

Chemical–mechanical polishing experiments produced optical-quality low-scatter surfaces on single-crystal silicon. An alkaline silica hydrosol slurry and preconditioned pitch laps generated high-quality optically flat surfaces after several hours of polishing. The best results produced a λ/34 peak-to-peak surface having a 6-Å rms surface roughness using bowl-feed polishing and a persuader plate.

© 1980 Optical Society of America

History
Original Manuscript: January 23, 1980
Published: July 15, 1980

Citation
R. B. Mcintosh and R. A. Paquin, "Chemical–mechanical polishing of low-scatter optical surfaces," Appl. Opt. 19, 2329-2331 (1980)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-19-14-2329


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References

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