Chemical-mechanical polishing of low-scatter optical surfaces
Applied Optics, Vol. 19, Issue 14, pp. 2329-2331 (1980)
http://dx.doi.org/10.1364/AO.19.002329
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Abstract
Chemical-mechanical polishing experiments produced optical-quality low-scatter surfaces on single-crystal silicon. An alkaline silica hydrosol slurry and preconditioned pitch laps generated high-quality optically flat surfaces after several hours of polishing. The best results produced a λ/34 peak-to-peak surface having a 6-Å rms surface roughness using bowl-feed polishing and a persuader plate.
© 1980 Optical Society of America
Citation
R. B. McIntosh, Jr. and R. A. Paquin, "Chemical-mechanical polishing of low-scatter optical surfaces," Appl. Opt. 19, 2329-2331 (1980)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-19-14-2329
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