Chemical-mechanical polishing experiments produced optical-quality low-scatter surfaces on single-crystal silicon. An alkaline silica hydrosol slurry and preconditioned pitch laps generated high-quality optically flat surfaces after several hours of polishing. The best results produced a λ/34 peak-to-peak surface having a 6-Å rms surface roughness using bowl-feed polishing and a persuader plate.
© 1980 Optical Society of America
R. B. McIntosh, Jr. and R. A. Paquin, "Chemical-mechanical polishing of low-scatter optical surfaces," Appl. Opt. 19, 2329-2331 (1980)