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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 20, Iss. 13 — Jul. 1, 1981
  • pp: 2257–2262

Periodic aperture size measurement with submicron accuracy: application to nonuniform detection in color CRT shadow masks

Akito Iwamoto and Hidekazu Sekizawa  »View Author Affiliations


Applied Optics, Vol. 20, Issue 13, pp. 2257-2262 (1981)
http://dx.doi.org/10.1364/AO.20.002257


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Abstract

A novel periodic aperture size measurement optical system, which makes use of a coherent light beam/lens 2-D Fourier-transform property, is proposed. Measuring gain and errors is discussed. This optical system is able to produce aperture widths on a 3-D formed surface with the same accuracy as those on a flat surface and is well suited for measuring small aperture size variations in shadow masks for color TV tubes. These variations in shadow masks are considered to cause luminous and color nonuniformities and have been detected heretofore only by visual inspection. The minimum detectable size variation for this new measuring method is ∼0.1 μm.

© 1981 Optical Society of America

History
Original Manuscript: October 27, 1980
Published: July 1, 1981

Citation
Akito Iwamoto and Hidekazu Sekizawa, "Periodic aperture size measurement with submicron accuracy: application to nonuniform detection in color CRT shadow masks," Appl. Opt. 20, 2257-2262 (1981)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-20-13-2257


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References

  1. A. L. Flamholz, H. A. Frost, IBM J. Res. Dev. 17, 509 (1973). [CrossRef]
  2. J. J. Moscony, RCA Eng. 25, 30 (1979).
  3. A. Papoulis, Systems and Transforms with Applications in Optics (McGraw-Hill, New York, 1968).
  4. A. Iwamoto (to be published).

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