Abstract

A new optical technique for the determination of spatial distributions of the thickness and the optical constants of thin films is proposed. This technique is simple and nondestructive involving mainly an ellipsometer and a coherent light source, and no contact to the thin-film samples is required. A theoretical estimation indicates that this technique may provide a spatial resolution close to the diffraction-limited resolution under certain conditions. Possible applications of this technique are also discussed.

© 1981 Optical Society of America

Determination of optical constants of absorbing materials using transmission and reflection of thin films on partially metallized substrates: analysis of the new (T,Rm) technique

A. Hjortsberg
Appl. Opt. 20(7) 1254-1263 (1981)

Laser interferometry for the determination of thickness distributions of low absorbing films and their spatial and thickness resolutions

Teruhito Mishima and Kwan C. Kao
Appl. Opt. 21(6) 1101-1105 (1982)

Determination of the optical constants and thickness of thin films on slightly absorbing substrates

Rusli and G. A. J. Amaratunga
Appl. Opt. 34(34) 7914-7924 (1995)

Determination of 2-D thickness distributions of low absorbing thin films by new laser interferometry

Teruhito Mishima and Kwan C. Kao
Appl. Opt. 21(16) 2894-2896 (1982)

Simultaneous determination of thickness and optical constants of polymer thin film by analyzing transmittance

Changsoo Jung and Bum Ku Rhee
Appl. Opt. 41(19) 3861-3865 (2002)