Photofabrication techniques using positive photoresists, developed for the quantity production of theodolite circular scales, have been adapted to making master chrome masks for photoetching moire fringe radial diffraction gratings. Diamond stylus wear, or chipping of the diamond tip, on a precision surface measuring instrument is difficult to detect and can cause incorrect surface texture measurements. A stylus wear standard was developed, and fabrication problems were solved by the anisotropic etching of a silicon slice using a chrome mask and photoresist. An essential feature of this process was precise orientation of the mask with a crystal cleavage plane. Experience gained suggests the means for quantitative quality control of diamond tools used for micromachining.

© 1981 Optical Society of America

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription