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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 20, Iss. 23 — Dec. 1, 1981
  • pp: 4062–4072

Optical effects of energetic copper-ion irradiation on copper mirrors

John S. Hartman  »View Author Affiliations


Applied Optics, Vol. 20, Issue 23, pp. 4062-4072 (1981)
http://dx.doi.org/10.1364/AO.20.004062


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Abstract

The optical effects of radiation damage to metal mirrors have been examined using copper-ion beams incident on copper mirrors. Incident ion energies of 2, 5, and 8 MeV were used and dose levels were examined up to 4 × 1016 ions/cm2. Both crystalline and OFHC copper mirrors were studied. In situ ellipsometric data were recorded (λ = 633 nm) during the irradiations to determine the dose-dependent behavior of the radiation effects. Spectral reflectivity and optical scattering were evaluated for samples before and after the irradiations. Complementary analysis of the samples was performed with scanning electron microscopy, Auger electron spectroscopy, and electron spectroscopy for chemical analysis. Significant changes in ellipometric parameters were noted during the irradiations. After exposure to large dose values, the optical properties of crystalline mirrors were consistent with the optical properties of bare copper. The ellipsometric changes have been attributed to alteration of the surface oxide film. Dose-dependent data have been used to determine the important damage mechanisms.

© 1981 Optical Society of America

History
Original Manuscript: November 10, 1981
Published: December 1, 1981

Citation
John S. Hartman, "Optical effects of energetic copper-ion irradiation on copper mirrors," Appl. Opt. 20, 4062-4072 (1981)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-20-23-4062

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