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Applied Optics

Applied Optics


  • Vol. 20, Iss. 9 — May. 1, 1981
  • pp: 1630–1634

Integrated Fresnel lens on thermally oxidized silicon substrate

P. Mottier and S. Valette  »View Author Affiliations

Applied Optics, Vol. 20, Issue 9, pp. 1630-1634 (1981)

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Thin film Fresnel lenses have been achieved on SiO2/Si substrates covered with a waveguide layer of Si3N4 grown by low pressure chemical vapor deposition (LPCVD). The phase shift between the different zones is induced by a SiO2 top layer chemically etched. The use of this additional layer having a smaller refractive index than the waveguide results in a saturation of the lens characteristics vs the thickness of the SiO2 layer; this feature associated with the good reproducibility of the LPCVD technology allows good control of the lens characteristics.

© 1981 Optical Society of America

Original Manuscript: June 12, 1980
Published: May 1, 1981

P. Mottier and S. Valette, "Integrated Fresnel lens on thermally oxidized silicon substrate," Appl. Opt. 20, 1630-1634 (1981)

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