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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 20, Iss. 9 — May. 1, 1981
  • pp: 1630–1634

Integrated Fresnel lens on thermally oxidized silicon substrate

P. Mottier and S. Valette  »View Author Affiliations


Applied Optics, Vol. 20, Issue 9, pp. 1630-1634 (1981)
http://dx.doi.org/10.1364/AO.20.001630


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Abstract

Thin film Fresnel lenses have been achieved on SiO2/Si substrates covered with a waveguide layer of Si3N4 grown by low pressure chemical vapor deposition (LPCVD). The phase shift between the different zones is induced by a SiO2 top layer chemically etched. The use of this additional layer having a smaller refractive index than the waveguide results in a saturation of the lens characteristics vs the thickness of the SiO2 layer; this feature associated with the good reproducibility of the LPCVD technology allows good control of the lens characteristics.

© 1981 Optical Society of America

History
Original Manuscript: June 12, 1980
Published: May 1, 1981

Citation
P. Mottier and S. Valette, "Integrated Fresnel lens on thermally oxidized silicon substrate," Appl. Opt. 20, 1630-1634 (1981)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-20-9-1630

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